From Event: SPIE Optical Engineering + Applications, 2018
The ESRF Multilayer Laboratory has been operating a thin film x-ray reflectometer for more than 20 years. It is a critical piece of equipment needed to calibrate the multilayer deposition system and to characterize thin film based optical elements. The previous instrument had a number of drawbacks such as limitations in sample size and weight. In addition, the outdated control electronics had to be replaced. The new x-ray reflectometer was designed to handle up to 1 m long samples with a weight of 40 kg while maintaining a positioning accuracy of a few micrometres. The instrument includes a Cu K alpha micro-focus source followed by a Montel multilayer collimator. It can be operated in monochromatic or pink mode by inserting or removing a channel cut crystal monochromator. This work will give an overview on the mechanical and optical design. It will summarize performance benchmarks and give examples of measured x-ray spectra.
Ch. Morawe, J.-Ch. Peffen, and P. Pakawanit, "The new ESRF thin-film x-ray reflectometer," Proc. SPIE 10760, Advances in X-Ray/EUV Optics and Components XIII, 1076005 (Presented at SPIE Optical Engineering + Applications: August 20, 2018; Published: 17 September 2018); https://doi.org/10.1117/12.2319833.
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