From Event: SPIE Advanced Lithography, 2019
In this paper, Canon will report on our most advanced 300 mm i-line stepper, the FPA-5550iZ2. Steppers enjoy an inherent productivity advantage, and Canon has developed solutions that overcome stepper disadvantages to realize an exposure tool with high overlay accuracy and excellent productivity. We will review Canon’s 300 mm i-line steppers evolutions that started in 2001 when our first 300 mm i-line stepper provided only 84 wafer per hour (wph) throughput. In 2018, our latest FPA5550iZ2 has evolved to realize more than 250wph for productivity while maintaining the same base design and almost same footprint. This paper will report the technologies that improve productivity and introduce current and underdevelopment functions that can enhance customer processes.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ken-Ichiro Mori, Atsushi Shigenobu, Junichi Motojima, and Hiromi Suda, "A study on stepper's performance enhancements," Proc. SPIE 10961, Optical Microlithography XXXII, 109610I (Presented at SPIE Advanced Lithography: February 27, 2019; Published: 20 March 2019); https://doi.org/10.1117/12.2513658.