Multilayer dielectric materials are used to tailor the optical properties of interfaces. While laser damage resistant coatings have been carefully investigated, the potential of laser modifications in staked alternating dielectric layers has not been explored thoroughly. Here, we investigate the effects of ultrafast laser exposure on alternating stacks of SiO2 and SiNx dielectric films deposited on a substrate, focusing primarily on non-ablative exposure and on its effect on the layer intermixing and the resultant change of material properties. We are especially interested on the experimental characterization of the materials after femtosecond laser exposure, particularly on the post-exposure material structure.

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Ruben Ricca and Yves Bellouard, "Investigation of laser-matter interaction in transparent multilayer thin films (Conference Presentation)," Proc. SPIE 11270, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XX, 112700F (Presented at SPIE LASE: February 01, 2020; Published: 9 March 2020); https://doi.org/10.1117/12.2545056.6138742862001.