SPIE will celebrate the entry of Extreme Ultraviolet Lithography (EUVL) into high volume manufacturing (HVM) with a special retrospective session. Highlights will include perspectives by true pioneers of EUVL, the formation of early teams, the gathering of resources and organization of the industry based EUV LLC and its partnering with the three national laboratory ‘Virtual National Laboratory’, the hand-off to SEMATECH and industry partners, the emergence of key suppliers, and IC manufacturers’ efforts in partnership with ASML and other suppliers.
Nelson M. Felix and David T. Attwood Jr., "EUV Lithography Perspective: from the beginning to HVM (Conference Presentation)," Proc. SPIE 11323, Extreme Ultraviolet (EUV) Lithography XI, 113232O (Presented at SPIE Advanced Lithography: 28 April 2020; Published: 28 April 2020); https://doi.org/10.1117/12.2572271.6152710307001.
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