The topic of this year’s symposium-wide panel is “A toast to Lithography's past: what we learned from technologies not used in HVM.” Over the years, a number of lithographic concepts were pursued for use in manufacturing when optical lithography finally reached its long-anticipated limits. While there appeared to be good reasons initially to invest substantially, in terms of people and money, in these concepts, most were not ultimately adopted for use in high-volume manufacturing (HVM). In this year’s symposium-wide panel, people who were involved in developing these concepts will share their perspectives on what lessons can be learned from their experiences.
Chris A. Mack and Harry J. Levinson, "A toast to Lithography's past: what we learned from technologies not used in HVM (Conference Presentation)," Proc. SPIE 11323, Extreme Ultraviolet (EUV) Lithography XI, 113232P (Presented at SPIE Advanced Lithography: 28 April 2020; Published: 28 April 2020); https://doi.org/10.1117/12.2572272.6152711270001.
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