From Event: SPIE Advanced Lithography + Patterning, 2023
In this study, we applied the PointRend (Point-based Rendering) method to semiconductor defect segmentation. PointRend is an iterative segmentation algorithm inspired by image rendering in computer graphics, a new image segmentation method that can generate high-resolution segmentation masks. It can also be flexibly integrated into common instance segmentation meta-architecture such as Mask-RCNN and semantic meta-architecture such as FCN. We implemented a model, termed as SEMI-PointRend, to generate precise segmentation masks by applying the PointRend neural network module. In this paper, we focus on comparing the defect segmentation predictions of SEMI-PointRend and Mask-RCNN for various defect types (line-collapse, single bridge, thin bridge, multi bridge non-horizontal). We show that SEMI-PointRend outperforms Mask R-CNN by up to 18.8% in terms of segmentation mean average precision.
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MinJin Hwang, Bappaditya Dey, Enrique Dehaerne, Sandip Halder, and Young-han Shin, "SEMI-PointRend: improved semiconductor wafer defect classification and segmentation as rendering," Proc. SPIE 12496, Metrology, Inspection, and Process Control XXXVII, 1249608 (Presented at SPIE Advanced Lithography + Patterning: February 27, 2023; Published: 27 April 2023); https://doi.org/10.1117/12.2657555.