From Event: SPIE Advanced Lithography + Patterning, 2023
In this paper the use of the EPE metric directly in the process optimization method for a DRAM use case has been researched. We show that EPE-aware optimization, using scanner dose and overlay control sub-recipes, is outperforming conventional optimization in terms of EPE Dies in Spec. Hence, it can be expected that also device yield can be improved by EPE-aware control.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Inho Kwak, Nanhyung Kim, Inbeom Yim, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Pieter Brandt, Kateryna Lyakhova, Marco Mueller, Ferhad Kamalizadeh, Antonio Corradi, Yun-A Sung, Thomas Kim, Stefan Smith-Meerman, Stefan van der Sanden, Sung-Min Park, Bob Boo, and Hyok-Man Kwon, "EPE-aware process optimization for scanner dose and overlay in DRAM use case," Proc. SPIE 12496, Metrology, Inspection, and Process Control XXXVII, 124960N (Presented at SPIE Advanced Lithography + Patterning: February 28, 2023; Published: 27 April 2023); https://doi.org/10.1117/12.2658274.
