From Event: SPIE Advanced Lithography + Patterning, 2023
This conference presentation was prepared for SPIE Advanced Lithography + Patterning, 2023.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ran Alkoken, Sandip Halder, Hyo Seon Suh, Mor Baram, Gadi Oron, Kasturi Saha, Kevin Houchens, and Yarden Melamed, "Effects of 0.55NA EUV material stack on eBeam metrology performance," Proc. SPIE 12496, Metrology, Inspection, and Process Control XXXVII, 1249616 (Presented at SPIE Advanced Lithography + Patterning: March 01, 2023; Published: 30 April 2023); https://doi.org/10.1117/12.2658249.6323663922112.