Infiltration synthesis of vapor-phase precursors is ex-situ route of converting established polymeric resists into hybrids. The concept initially modelled over polymethylmethacrylate (PMMA)-AlOx hybrid has been expanded to infiltrating several metal oxide moieties into high sensitivity resist (HSR). Beyond implementing single metal oxide species, alloyed infiltration is explored as a means to limit pattern roughness originating from granular crystallites. Lithography performance of these new generation of hybrid positive tone resists is assessed towards contact-hole patterning.

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Nikhil M. Tiwale, Ashwanth Subramanian, Won-Il Lee, Ming Lu, Aaron Stein, Jiyoung Kim, and Chang-Yong Nam, "Hybrid positive-tone resist synthesis via vapor phase infiltration for contact-hole patterning," Proc. SPIE 12498, Advances in Patterning Materials and Processes XL, 124981A (Presented at SPIE Advanced Lithography + Patterning: March 02, 2023; Published: 30 April 2023); https://doi.org/10.1117/12.2658659.6325345608112.