Optical devices with features exhibiting ultra low reflectivity on the order of 10-7 specular reflectance in the visible spectrum are required for coronagraph instruments and some spectrometers employed in space research. Nanofabrication technologies have been developed to produce such devices with various shapes and feature dimensions to meet these requirements. Infrared reflection is also suppressed significantly with chosen wafers and processes. Particularly, devices with very high (>0.9) and very low reflectivity (<10-7) on adjacent areas have been fabricated and characterized. Significantly increased surface area due to the long needle like nano structures also provides some unique applications in other technology areas. We present some of the approaches, challenges and achieved results in producing and characterizing such devices currently employed in laboratory testbeds and instruments.
Victor E. White, Karl Y. Yee, Kunjithapatham Balasubramanian, Pierre M. Echternach, Richard E. Muller, Matthew R. Dickie, Eric Cady, Daniel J. Ryan, Michael Eastwood, Byron van Gorp, A. J. Eldorado Riggs, Niel Zimmerman, and N. Jeremy Kasdin, "Nanofabrication of ultra-low reflectivity black silicon surfaces and devices (Presentation Recording)," Proc. SPIE 9556, Nanoengineering: Fabrication, Properties, Optics, and Devices XII, 955609 (Presented at SPIE Nanoscience + Engineering: August 11, 2015; Published: 5 October 2015); https://doi.org/10.1117/12.2189216.4519371372001.
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