A major problem in the optical lithography was the diffraction limit. Here, we report and demonstrate a lithography method, Quantum Optical Lithography [1,2], able to attain 1 nm resolution by optical means using new materials (fluorescent photosensitive glass-ceramics and QMC-5 resist). The performance is several times better than that described for any optical or Electron Beam Lithography (EBL) methods. In Fig. 1 we present TEM images of 1 nm lines recorded at 9.6 m/s.
Fig. 1 TEM images of: a) multiple 1 nm lines written in a fluorescent photosensitive glass-ceramics sample;
b) single 1 nm line written in QMC-5 resist.
 E. Pavel, S. Jinga, B.S. Vasile, A. Dinescu, V. Marinescu, R. Trusca and N. Tosa, “Quantum Optical Lithography from 1 nm resolution to pattern transfer on silicon wafer“, Optics and Laser Technology, 60 (2014) 80-84.
 E. Pavel, S. Jinga, E. Andronescu, B.S. Vasile, G. Kada, A. Sasahara, N. Tosa, A. Matei, M. Dinescu, A. Dinescu
and O.R. Vasile, “2 nm Quantum Optical Lithography“, Optics Communications,291 (2013) 259–263
Eugen Pavel, "Nanofabrication at 1nm resolution by quantum optical lithography (Presentation Recording)," Proc. SPIE 9556, Nanoengineering: Fabrication, Properties, Optics, and Devices XII, 95560L (Presented at SPIE Nanoscience + Engineering: August 12, 2015; Published: 5 October 2015); https://doi.org/10.1117/12.2187249.4519371357001.
Conference Presentations are recordings of oral presentations given at SPIE conferences and published as part of the proceedings. They include the speaker's narration with video of the slides and animations. Most include full-text papers. Interactive, searchable transcripts and closed captioning are now available for most presentations.
Search our growing collection of more than 27,500 conference presentations, including many plenaries and keynotes.