Hyperlens was already shown to facilitate the sub-diffraction imaging in the far-field by converting the sub-wavelength information carried by evanescent wave components into the propagating waves and magnifying those sub-wavelength details to the scales that can be resolved by conventional optical components. In this talk, we will discuss the case when the hyperlens is used in a reverse way, such that the incident light enters on the outer surface of the hyperlens and collected on the inner surface, the device may function as a de-magnifier. In particular, if a pattern of a large size (above the diffraction limit) is recorded on the outer surface serving as a mask, the sub-wavelength image can be achieved on the inner side of the hyperlens. While this idea was validated using numerical simulations, no experimental demonstration was reported to date.
In this talk, we demonstrate de-magnifying hyperlens in laboratory experiments and discuss its potential applications. For example, one of such potential applications is sub-wavelength photolithography. Photolithography is the most widely used fabrication technique in integrated circuit industry. However, further decreasing the feature size becomes challenging, in particular, due to the diffraction limit. We experimentally show de-magnifying property of a spherical hyperlens composed of metal-dielectric multilayer structure with a Cr mask on its outer surface. A photoresist was spin-coated on the inner surface of the hyperlens to record the image. After exposure with 405nm light, the pattern on the mask was recorded in the photoresist on the inner surface of the hyperlens, demonstrating 1.6x de-magnification.
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