Extreme optical fabrication projects known as EUV and X-ray optic systems, which are representative of today’s advanced optical manufacturing technology level, have special requirements for the optical surface quality. In synchroton radiation (SR) beamlines, mirrors of high shape accuracy is always used in grazing incidence. In nanolithograph systems, middle spatial frequency errors always lead to small-angle scattering or flare that reduces the contrast of the image. The slope error is defined for a given horizontal length, the increase or decrease in form error at the end point relative to the starting point is measured. The quality of reflective optical elements can be described by their deviation from ideal shape at different spatial frequencies. Usually one distinguishes between the figure error, the low spatial error part ranging from aperture length to 1mm frequencies, and the mid-high spatial error part from 1mm to 1 μm and from1 μm to some 10 nm spatial frequencies, respectively. Firstly, this paper will disscuss the relationship between slope error and middle spatial frequency error, which both describe the optical surface error along with the form profile. Then, experimental researches will be conducted on a high gradient precise aspheric with pitch tool, which aim to restraining the middle spatial frequency error.
Jia Wang, Xi Hou, Yongjian Wan, Chunyan Shi, and Xianyun Zhong, "Research on controlling middle spatial frequency error of high gradient precise aspheric by pitch tool," Proc. SPIE 9927, Nanoengineering: Fabrication, Properties, Optics, and Devices XIII, 99270J (Presented at SPIE Nanoscience + Engineering: August 30, 2016; Published: 3 November 2016); https://doi.org/10.1117/12.2236800.
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