One-dimensional multilayer gratings were prepared by four steps. A periodic Si/SiO2 multilayer was firstly deposited on Si substrate using a magnetron sputtering coating process. Then, the multilayer was been bonded and split into small pieces by diamond wire cutting. The side-wall of the cut sample was subsequently grinded and polished until the surface roughness was less than 1nm. Finally, the SiO2 layers were selective etched using hydrofluoric acid to form the grating structure. In the above steps, special attentions were given to optimize the etching processes to achieve a uniform and smooth grating pattern. Transmission electron microscope (TEM) was used to characterize the multilayer gratings. The pitch size of the grating was evaluated by an offline image analysis algorithm and optimized processes are discussed.
Xingrui Wang, Yang Zhao, Jie Liu, Jie Chen, Tongbao Li, and Xinbin Cheng, "Fabrication and characterization of one-dimensional multilayer gratings for nanoscale microscope calibration," Proc. SPIE 9927, Nanoengineering: Fabrication, Properties, Optics, and Devices XIII, 99270M (Presented at SPIE Nanoscience + Engineering: August 31, 2016; Published: 15 September 2016); https://doi.org/10.1117/12.2236866.
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