In this study, we demonstrated the use of DNA-CTMA (DC) in combination with Nickel Nanostrands (NiNs) for application in Electromagnetic Interference (EMI) shielding. The addition of NiNs fillers to DC led to films with higher shielding effectiveness (SE) than when Silver nanoparticles were used. An enhanced EMI shielding effectiveness (SE) was also achieved by the fabrication of the DC-NiNs shielding film structure in a layered architecture. Very thin layer of Guanine (∼60 nm) were inserted between layers of DNA-NiNs (∼ 100um each) to total a thickness of 500um of the shielding film. An increase of the SE by 6-8 dB for the layered structure as compared to the bulk thick film with NiNs loadings up to 10 wt%. At higher loadings (>10 wt. %), a significant physical degradation of the films was observed for all films regardless of the thickness or the process of fabrication.
Fahima Ouchen, Benjamin G. Wilson, Perry P. Yaney, Michael M. Salour, and James G. Grote, "Deoxyribonucleic acid (DNA)-Ni-nanostrands composites for EMI shielding," Proc. SPIE 9928, Nanobiosystems: Processing, Characterization, and Applications IX, 992808 (Presented at SPIE Nanoscience + Engineering: August 28, 2016; Published: 18 October 2016); https://doi.org/10.1117/12.2238815.
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