A scalable nanofabrication technique for chiral metamaterials is presented, which combines the dynamic shadowing growth and self-assembled nanosphere monolayers, and is also known as nanosphere shadowing lithography. We have developed two strategies based on nanosphere shadowing lithography to prepare chiral nanostructures. The first strategy is to create a quasi-three-dimensional single-layer fan-shaped chiral nanostructure on nanospheres with one plasmonic material. The second strategy is to create three-dimensional multi-layers helical nanostructures with one plasmonic material and one dielectric material. Both strategies can produce large-area chiral nanostructures with strong chiral optical response, which makes nanosphere shadowing lithography suitable for producing chiral metamaterial based devices such as an ultrathin narrow-band circular polarizer.
Yizhuo He and Yiping Zhao, "Designing large scale chiral metamaterials by nanosphere shadowing lithography," Proc. SPIE 9929, Nanostructured Thin Films IX, 99290B (Presented at SPIE Nanoscience + Engineering: August 30, 2016; Published: 26 September 2016); https://doi.org/10.1117/12.2236351.
Conference Presentations are recordings of oral presentations given at SPIE conferences and published as part of the conference proceedings. They include the speaker's narration along with a video recording of the presentation slides and animations. Many conference presentations also include full-text papers. Search and browse our growing collection of more than 14,000 conference presentations, including many plenary and keynote presentations.
Study of self-shadowing effect as a simple means to realize nanostructured thin films and layers with special attentions to birefringent obliquely deposited thin films and photo-luminescent porous silicon