From Event: SPIE Optical Engineering + Applications, 2016
Atom lithography has now become an important means for manufacturing Nano-scale gratings, which are indispensable instruments for Nano-scale dimensional metrology. However, the presence of laser frequency drift makes the results unsatisfactory. Using the atoms’ laser induced fluorescence (LIF) to stabilize the laser frequency provides an effective method of overcoming the drift. This paper gives an analysis with regard to our own experimentation conditions in some aspects, such as fluorescence of Cr beam, difference signal, the correlation between laser frequency and the central of fluorescence. Based on the analysis, the laser induced fluorescence frequency stabilizing equipment is built in our selfdesigned system of chromium atom lithography. The laser is detuned near the wavelength of the 7S3→7P40 transition of 52Cr, so that the atom beam could be illuminated. The power of the laser we used is 15mW. The position of the fluorescent spot depends on detune of the laser. This spot is imaged onto a split- photodiode. Whenever the laser frequency exhibits some deviations from the desired value, the difference signal between the right and the left area of the detector is non-zero. The measured signal is used to servo-lock the laser. It is acquired by the servo-lock port of the Ti:sapphire laser. As a result, the laser frequency is stabilized in the wavelength corresponding to 7S3→7P40 transition of 52Cr. The stability is superior
Tong Zhang, Yuejin Zhao, and Cong Yin, "Laser stabilization in atom lithography based on LIF signal from the chromium beam," Proc. SPIE 9948, Novel Optical Systems Design and Optimization XIX, 99480S (Presented at SPIE Optical Engineering + Applications: August 30, 2016; Published: 29 September 2016); https://doi.org/10.1117/12.2237099.
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