From Event: SPIE Optical Engineering + Applications, 2016
Optical systems for lithography (projection lens), inspection (micro-objectives) or laser material processing usually have tight specifications regarding focus and wave-front stability. The same is true regarding the field dependent properties. Especially projection lenses have tight specifications on field curvature, magnification and distortion. Unwanted heating either from internal or external sources lead to undesired changes of the above properties. In this work we show an elegant and fast method to analyze the thermal sensitivity using ZEMAX. The key point of this method is using the thermal changes of the lens data from the multi-configuration editor as starting point for a (standard) tolerance analysis. Knowing the sensitivity we can either define requirements on the environment or use it to systematically improve the thermal behavior of the lens. We demonstrate this method for a typical projection lens for which we optimized the thermal field curvature to a minimum.
J. Werschnik and K. Uhlendorf, "Method for quick thermal tolerancing of optical systems," Proc. SPIE 9951, Optical System Alignment, Tolerancing, and Verification X, 99510L (Presented at SPIE Optical Engineering + Applications: August 29, 2016; Published: 27 September 2016); https://doi.org/10.1117/12.2236687.
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