From Event: SPIE Optical Engineering + Applications, 2016
The growing interest in the study of the extreme ultraviolet (EUV) radiation-matter interaction is feeding up the
development of new technologies able to overcame some current technological limits. Adaptive optics is an established
technology already widely used for wavefront correction in many applications such as astronomical telescopes, laser
communications, high power laser systems, microscopy and high resolution imaging systems. Although this technology
is already exploited in the EUV and X-ray range, its usage is only feasible in systems with a grazing incidence
configuration. On the other hand, the development of a EUV normal incidence adaptive optics can open new interesting
possibilities in many different fields ranging from free electron laser and synchrotron applications up to EUV
In this work we report the preliminary results achieved in the developing of a normal incidence EUV multilayered
adaptive mirror tuned at 30.4nm. The proper functioning and potential applications of such device have been
demonstrated by using a High order Harmonics Generation (HHG) source.
Alain Jody Corso, Stefano Bonora, Paola Zuppella, Peter Baksh, Magdalena Miszczak, William Brocklesby, Zhanshan Wang, Piergiorgio Nicolosi, and Maria Guglielmina Pelizzo, "Developing an EUV multilayer adaptive mirror: the first results," Proc. SPIE 9963, Advances in X-Ray/EUV Optics and Components XI, 99630K (Presented at SPIE Optical Engineering + Applications: September 01, 2016; Published: 15 September 2016); https://doi.org/10.1117/12.2238541.
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