From Event: Photomask Japan 2022, 2022
This conference presentation was prepared for Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 2022.
© (15 September 2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ryo Kobayashi, "Study of pattern quality improvement in replica template process," Proc. SPIE PC12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1232506 (Presented at Photomask Japan 2022: 15 September 2022; Published: 15 September 2022); https://doi.org/10.1117/12.2656129.6312116900112.