From Event: Photomask Japan 2022, 2022
This conference presentation was prepared for Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 2022.
© (15 September 2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jan van Schoot, "High-NA EUVL exposure tool: program progress and mask interaction," Proc. SPIE PC12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250A (Presented at Photomask Japan 2022: 15 September 2022; Published: 15 September 2022); https://doi.org/10.1117/12.2656140.6312118185112.