From Event: SPIE Advanced Lithography + Patterning, 2023
The Edge-placement-error requirements keep progressively scaling down in immersion lithography process in conjunction with Immersion lightsource technology. We studied quantification analysis of impact on resist LWR/ LER to the speckle dependency by;
a. LWR/LER by analyzing the Power Spectral Density (PSD) curves.
b. key frequency components by the photo resist and/ or the speckle contrast such based on PSD tendency by # of pulse use during exposure
c. further speckle contrast reduction for LWR/ LER enhancement by 4X extension of Pulse duration.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Toshihiro Oga, Takamitsu Komaki, Takeshi Ohta, Shinichi Matsumoto, Takashi Saitou, Tomohiro Iwaki, Kanji Sugino, and Katsunori Otsuki, "To enhance EPE through PSD based quantification analysis of resist impact and lightsource induced LWR/LER," Proc. SPIE PC12494, Optical and EUV Nanolithography XXXVI, PC124940C (Presented at SPIE Advanced Lithography + Patterning: March 02, 2023; Published: 30 April 2023); https://doi.org/10.1117/12.2658142.6323678254112.
