Most new nanolithography techniques are demonstrated over very mall working areas. An important milestone was reached at the TU Ilmenau with the development of a 4-inch nanofabrication and nanomeasuring machine, which is equipped with a special SPL/AFM head. The advanced interferometric air-bearing stage allows an exorbitant resolution of 20 picometres within the full range of 4 inch. A very high structuring accuracy is achieved. The tip-based lithography process based on Fowler-Nordheim electron field emission results in immediate patterning with very small line widths. In the paper, the exceptionally high measurement and fabrication accuracy will be comprehensively presented and discussed.

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Eberhard Manske, Ivo W. Rangelow, Jaqueline Stauffenberg, Thomas Kissinger, Ingo Ortlepp, Thomas Fröhlich, Denis Dontsov, and Alexander Reum, "High-localized nanolithography based on high-precision nanopositioning and nanomeasuring machines," Proc. SPIE PC12497, Novel Patterning Technologies 2023, PC124970A (Presented at SPIE Advanced Lithography + Patterning: March 01, 2023; Published: 30 April 2023); https://doi.org/10.1117/12.2658705.6325348071112.