From Event: SPIE Advanced Lithography + Patterning, 2023
This conference presentation was prepared for the Advanced Etch Technology and Process Integration for Nanopatterning XII conference at SPIE Advanced Lithography + Patterning 2023.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Massud A. Aminpur, Erik Geiss, Vijayalakshmi Seshashalam, Brendan O'Brien, Jean Raymod Fakhoury, Joerg Paufler, San Leong Liew, Ken Shea, Keith Donegan, Ryan Sporer, and Wenhe Lin, "Challenges in advanced 300mm silicon photonics technology," Proc. SPIE PC12499, Advanced Etch Technology and Process Integration for Nanopatterning XII, PC124990A (Presented at SPIE Advanced Lithography + Patterning: March 01, 2023; Published: 30 April 2023); https://doi.org/10.1117/12.2658702.6325348572112.