PROCEEDINGS VOLUME 0275
1981 MICROLITHOGRAPHY CONFERENCES | MAR 30 - APR 2 1981
Semiconductor Microlithography VI
IN THIS VOLUME

0 Sessions, 28 Papers, 0 Presentations
All Papers  (28)
1981 MICROLITHOGRAPHY CONFERENCES
Mar 30 - Apr 2 1981
San Jose, United States
All Papers
Proc. SPIE 0275, Submicron Optical Lithography?, 0000 (28 July 1981); doi: 10.1117/12.931867
Proc. SPIE 0275, Single And Dual Wavelength Exposure Of Photoresist, 0000 (28 July 1981); doi: 10.1117/12.931868
Proc. SPIE 0275, Pellicle Protection Of Integrated Circuit (IC) Masks, 0000 (28 July 1981); doi: 10.1117/12.931869
Proc. SPIE 0275, Precision Wafer Stepper Utilizing A Two-Dimensional Optical Encoder, 0000 (28 July 1981); doi: 10.1117/12.931870
Proc. SPIE 0275, Laser Scanning Autoalignment In Projection System, 0000 (28 July 1981); doi: 10.1117/12.931871
Proc. SPIE 0275, Prospects Of A Plasma Focus Device As An Intense X-Ray Source For Fine Line Lithography, 0000 (28 July 1981); doi: 10.1117/12.931872
Proc. SPIE 0275, Pulsed Plasma Source For X-Ray Lithography, 0000 (28 July 1981); doi: 10.1117/12.931873
Proc. SPIE 0275, Comprehensive Test Sequence For The Electron Beam Exposure System, 0000 (28 July 1981); doi: 10.1117/12.931874
Proc. SPIE 0275, Mask Fabrication Using Electron Beam Exposure System, 0000 (28 July 1981); doi: 10.1117/12.931875
Proc. SPIE 0275, Simultaneous Transfer Of A Fine Pattern On Two Complementary Or Identical Replicas By X-Ray Lithography, 0000 (28 July 1981); doi: 10.1117/12.931876
Proc. SPIE 0275, Automatic Defect Detection: Instrument Comparison And Application, 0000 (28 July 1981); doi: 10.1117/12.931877
Proc. SPIE 0275, Automated Wafer Flatness Characterization System, 0000 (28 July 1981); doi: 10.1117/12.931878
Proc. SPIE 0275, Quantitative Sub-Micrometer Linewidth Determination Using Electron Microscopy, 0000 (28 July 1981); doi: 10.1117/12.931879
Proc. SPIE 0275, Factors Affecting Linewidth Control Including Multiple Wavelength Exposure And Chromatic Aberration, 0000 (28 July 1981); doi: 10.1117/12.931880
Proc. SPIE 0275, Comparison Of Electron Beam And Optical Projection Lithography In The Region Of One Micrometer, 0000 (28 July 1981); doi: 10.1117/12.931881
Proc. SPIE 0275, Simulation Of Edge Location Error, 0000 (28 July 1981); doi: 10.1117/12.931882
Proc. SPIE 0275, Multilevel Resist For Photolithography Utilizing An Absorbing Dye: Simulation And Experiment, 0000 (28 July 1981); doi: 10.1117/12.931883
Proc. SPIE 0275, Deep-Ultraviolet (UV) Source For Two-Level Resist Technology, 0000 (28 July 1981); doi: 10.1117/12.931884
Proc. SPIE 0275, Simple Metal Lift-Off Process For 1 Micron Al/5% Cu Lines, 0000 (28 July 1981); doi: 10.1117/12.931885
Proc. SPIE 0275, Processing Of Deep-Ultraviolet (UV) Resists, 0000 (28 July 1981); doi: 10.1117/12.931886
Proc. SPIE 0275, Positive Versus Negative: A Photoresist Analysis, 0000 (28 July 1981); doi: 10.1117/12.931887
Proc. SPIE 0275, Resist Materials For High Resolution Photolithography, 0000 (28 July 1981); doi: 10.1117/12.931888
Proc. SPIE 0275, New Positive Photoresist For Critical Dimension Control, 0000 (28 July 1981); doi: 10.1117/12.931889
Proc. SPIE 0275, Electron Beam Resist And Photoresist Behavior Of Polychrome Positive Resist, 0000 (28 July 1981); doi: 10.1117/12.931890
Proc. SPIE 0275, Puddle Development Of Positive Photoresists, 0000 (28 July 1981); doi: 10.1117/12.931891
Proc. SPIE 0275, Microwave Curing: Is It A Reality?, 0000 (28 July 1981); doi: 10.1117/12.931892
Proc. SPIE 0275, Plasma Etching 1 Phosphorous-Doped Polysilicon Geometries At 30 Kilocycles, 0000 (28 July 1981); doi: 10.1117/12.931893
Proc. SPIE 0275, Cleaning Of Chromium On Glass Photomasks And Reticles, 0000 (28 July 1981); doi: 10.1117/12.931894
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