PROCEEDINGS VOLUME 0333
1982 MICROLITHOGRAPHY CONFERENCES | 1-2 JANUARY 1982
Submicron Lithography I
IN THIS VOLUME

0 Sessions, 27 Papers, 0 Presentations
All Papers  (27)
1982 MICROLITHOGRAPHY CONFERENCES
1-2 January 1982
Santa Clara, United States
All Papers
Proc. SPIE 0333, State Of The Art Of Acrylate Resists: An Overview Of Polymer Structure And Lithographic Performance, 0000 (30 June 1982); doi: 10.1117/12.933404
Proc. SPIE 0333, Application Of Methyl A-Chloroacrylate Copolymers As Electron Sensitive Positive Resists, 0000 (30 June 1982); doi: 10.1117/12.933405
Proc. SPIE 0333, New Microlithographic Resists, 0000 (30 June 1982); doi: 10.1117/12.933406
Proc. SPIE 0333, Plasma Resist Image Stabilization Technique (PRIST) Update, 0000 (30 June 1982); doi: 10.1117/12.933407
Proc. SPIE 0333, Intralevel Hybrid Resist Process With Submicron Capability, 0000 (30 June 1982); doi: 10.1117/12.933408
Proc. SPIE 0333, Multilevel Ge-Se Film Based Resist Systems, 0000 (30 June 1982); doi: 10.1117/12.933409
Proc. SPIE 0333, Quartz - The Ultimate Mask Material For Optical Lithography?, 0000 (30 June 1982); doi: 10.1117/12.933410
Proc. SPIE 0333, Sources For The Production And Spectral Control Of Deep Ultraviolet Radiation, 0000 (30 June 1982); doi: 10.1117/12.933411
Proc. SPIE 0333, Practical Deep Ultraviolet - The Multilayer Approach, 0000 (30 June 1982); doi: 10.1117/12.933412
Proc. SPIE 0333, Manufacturing Implications Of Multilevel Resist Processing, 0000 (30 June 1982); doi: 10.1117/12.933413
Proc. SPIE 0333, Metal Oxide Semiconductor (MOS) Technology Scaling Issues And Their Relation To Submicron Lithography, 0000 (30 June 1982); doi: 10.1117/12.933414
Proc. SPIE 0333, Low Energy Electron Beam Lithography, 0000 (30 June 1982); doi: 10.1117/12.933415
Proc. SPIE 0333, Electron Beam Testing And Its Application To Packaging Modules For Very Large Scale Integrated (VLSI) Chip Arrays, 0000 (30 June 1982); doi: 10.1117/12.933416
Proc. SPIE 0333, High Speed Direct Write Electron Beam System, 0000 (30 June 1982); doi: 10.1117/12.933417
Proc. SPIE 0333, Shaped Beams For Integrated Circuit Fabrication, 0000 (30 June 1982); doi: 10.1117/12.933418
Proc. SPIE 0333, X-Ray Lithography: Technology For The 1980s, 0000 (30 June 1982); doi: 10.1117/12.933419
Proc. SPIE 0333, X-Ray Mask Fabrication, 0000 (30 June 1982); doi: 10.1117/12.933420
Proc. SPIE 0333, X-Ray Lithography Applied To The Fabrication Of 1 µm N-Channel Metal Oxide Semiconductor (NMOS) Circuits, 0000 (30 June 1982); doi: 10.1117/12.933421
Proc. SPIE 0333, X-Ray Lithography: Fabrication Of Masks And Very Large Scale Integrated (VLSI) Devices, 0000 (30 June 1982); doi: 10.1117/12.933422
Proc. SPIE 0333, Application Of Zone Plates To Alignment In X-Ray Lithography, 0000 (30 June 1982); doi: 10.1117/12.933423
Proc. SPIE 0333, Trends In X-Ray Lithography, 0000 (30 June 1982); doi: 10.1117/12.933424
Proc. SPIE 0333, Plasma Sources For X-Ray Lithography, 0000 (30 June 1982); doi: 10.1117/12.933425
Proc. SPIE 0333, Resist Possibilities And Limitations In Ion Beam Lithography, 0000 (30 June 1982); doi: 10.1117/12.933426
Proc. SPIE 0333, Ion Beam Lithography System Using A High Brightness H2+ Ion Source, 0000 (30 June 1982); doi: 10.1117/12.933427
Proc. SPIE 0333, Ion-Channelling Effects In Scanning Microscopy And Ion Beam Writing With A 60 keV Ga+ Probe, 0000 (30 June 1982); doi: 10.1117/12.933428
Proc. SPIE 0333, On The Mechanism Of The Lithographic Sensitivity Enhancement Of Obliquely Deposited Germanium Selenide Films, 0000 (30 June 1982); doi: 10.1117/12.933429
Proc. SPIE 0333, Masked Ion Beam Lithography For Submicrometer Device Fabrication, 0000 (30 June 1982); doi: 10.1117/12.933430
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