PROCEEDINGS VOLUME 0334
1982 MICROLITHOGRAPHY CONFERENCES | 1-2 JANUARY 1982
Optical Microlithography I: Technology for the Mid-1980s
IN THIS VOLUME

0 Sessions, 33 Papers, 0 Presentations
All Papers  (33)
1982 MICROLITHOGRAPHY CONFERENCES
1-2 January 1982
Santa Clara, United States
All Papers
Proc. SPIE 0334, Variable Magnification In A 1:1 Projection Lithography System, 0000 (13 September 1982); doi: 10.1117/12.933553
Proc. SPIE 0334, Pattern Recognition Automatic Fine Alignment, 0000 (13 September 1982); doi: 10.1117/12.933554
Proc. SPIE 0334, Application Of Wafer Probe Techniques To The Evaluation Of Projection Printers, 0000 (13 September 1982); doi: 10.1117/12.933555
Proc. SPIE 0334, Registration Accuracy In Several Versions Of A Scanning 1:1 Optical Projection System, 0000 (13 September 1982); doi: 10.1117/12.933556
Proc. SPIE 0334, Spectral Exposure Meter, 0000 (13 September 1982); doi: 10.1117/12.933557
Proc. SPIE 0334, Proximity Effects And Influences Of Nonuniform Illumination In Projection Lithography, 0000 (13 September 1982); doi: 10.1117/12.933558
Proc. SPIE 0334, Characterization Of The Ultratech Wafer Stepper, 0000 (13 September 1982); doi: 10.1117/12.933559
Proc. SPIE 0334, Yield Improvement With Pellicalised Masks In Projection Printing Technology, 0000 (13 September 1982); doi: 10.1117/12.933560
Proc. SPIE 0334, Near-Term Case For 5x Versus 10x Wafer Steppers, 0000 (13 September 1982); doi: 10.1117/12.933561
Proc. SPIE 0334, Comparison Of Autoalign Techniques, 0000 (13 September 1982); doi: 10.1117/12.933562
Proc. SPIE 0334, Analysis Of Image Field Placement Deviations Of A 5x Microlithographic Reduction Lens, 0000 (13 September 1982); doi: 10.1117/12.933563
Proc. SPIE 0334, EUROSTEP 2000: New Steps In Wafer Steppers, 0000 (13 September 1982); doi: 10.1117/12.933564
Proc. SPIE 0334, Philips Wafer Stepper: Characterization And Processing Experience, 0000 (13 September 1982); doi: 10.1117/12.933565
Proc. SPIE 0334, Wafer Stepper Characterization And Process Control Techniques, 0000 (13 September 1982); doi: 10.1117/12.933566
Proc. SPIE 0334, Automated Wafer Stepping For Very Large Scale Integrated (VLSI) Fabrication, 0000 (13 September 1982); doi: 10.1117/12.933567
Proc. SPIE 0334, Mix And Match Of 10:1 Wafer Steppers With Die-By-Die Alignment To 1:1 Proximity And Projection Systems, 0000 (13 September 1982); doi: 10.1117/12.933568
Proc. SPIE 0334, Mix And Match-10x Reduction Wafer Steppers, 0000 (13 September 1982); doi: 10.1117/12.933569
Proc. SPIE 0334, Characterization Data And Cross Matching Of A High Performance Step-And-Repeat Aligner, 0000 (13 September 1982); doi: 10.1117/12.933570
Proc. SPIE 0334, Hybrid Lithography: Mixing Of 10:1 And 1:1 Projection Aligners, 0000 (13 September 1982); doi: 10.1117/12.933571
Proc. SPIE 0334, User Requirements In Plasma Etch Equipment, 0000 (13 September 1982); doi: 10.1117/12.933572
Proc. SPIE 0334, Faithful Pattern Transfer: What Are The Limits In Production?, 0000 (13 September 1982); doi: 10.1117/12.933573
Proc. SPIE 0334, Reactive Sputter Etching And Its Applications, 0000 (13 September 1982); doi: 10.1117/12.933574
Proc. SPIE 0334, Resist Characterization: Procedures, Parameters, And Profiles, 0000 (13 September 1982); doi: 10.1117/12.933575
Proc. SPIE 0334, New High Speed Positive Resist For Wafer Steppers, 0000 (13 September 1982); doi: 10.1117/12.933576
Proc. SPIE 0334, Characterization Of The Induction Effect At Mid-Ultraviolet Exposure: Application To AZ2400 At 313 Nm, 0000 (13 September 1982); doi: 10.1117/12.933577
Proc. SPIE 0334, Reticle Inspection Technology To Compare The Pattern Against Data, 0000 (13 September 1982); doi: 10.1117/12.933578
Proc. SPIE 0334, Automatic Mask And Reticle Inspection System, 0000 (13 September 1982); doi: 10.1117/12.933579
Proc. SPIE 0334, Electron Beam Versus Optical Step-And-Repeat: A 10X Reticle And 1X Die Distortion Study Employing Nikon X-Y Laser Interferometric Metrology, 0000 (13 September 1982); doi: 10.1117/12.933580
Proc. SPIE 0334, Detecting Submicron Pattern Defects On Optical Photomasks Using An Enhanced El-3 Electron-Beam Lithography Tool, 0000 (13 September 1982); doi: 10.1117/12.933581
Proc. SPIE 0334, New Deep Ultraviolet Source For Microlithography, 0000 (13 September 1982); doi: 10.1117/12.933582
Proc. SPIE 0334, Checking Of The Thickness Uniformity Of Thin-Film Layers In Semiconductor Devices By Laser Ellipso-Interferometry, 0000 (13 September 1982); doi: 10.1117/12.933583
Proc. SPIE 0334, Linewidth Vernier (LWV), 0000 (13 September 1982); doi: 10.1117/12.933584
Proc. SPIE 0334, Ultrafast High Resolution Contact Lithography Using Excimer Lasers, 0000 (13 September 1982); doi: 10.1117/12.933585
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