PROCEEDINGS VOLUME 0342
1982 TECHNICAL SYMPOSIUM EAST | 5-7 MAY 1982
Integrated Circuit Metrology I
IN THIS VOLUME

0 Sessions, 16 Papers, 0 Presentations
All Papers  (16)
1982 TECHNICAL SYMPOSIUM EAST
5-7 May 1982
Arlington, United States
All Papers
Proc. SPIE 0342, Photomask Iinewidth Measurement Correlation Techniques Using The Standard Reference Material (SRM) 474 National Bureau Of Standards (NBS) Linewidth Standard, 0000 (15 October 1982); doi: 10.1117/12.933673
Proc. SPIE 0342, Making Of Secondary Standards From National Bureau Of Standards (NBS) Photomask Standard, 0000 (15 October 1982); doi: 10.1117/12.933674
Proc. SPIE 0342, Use Of The National Bureau Of Standards (NBS) Antireflective (AR)-Chromium Optical Linewidth Standard For Measurements On Other Types Of Chromium Photomasks, 0000 (15 October 1982); doi: 10.1117/12.933675
Proc. SPIE 0342, Design Of An Optical Linewidth Standard Reference Material For Wafers, 0000 (15 October 1982); doi: 10.1117/12.933676
Proc. SPIE 0342, Automatic Detection And Quantification Of Contaminants On Reticles For Semiconductor Microlithography, 0000 (15 October 1982); doi: 10.1117/12.933677
Proc. SPIE 0342, Inspection In The Third Dimension: Metal Mask Inspection Problems, 0000 (15 October 1982); doi: 10.1117/12.933678
Proc. SPIE 0342, Improving Registration In Photolithography, 0000 (15 October 1982); doi: 10.1117/12.933679
Proc. SPIE 0342, Method Of Characterizing Wafer Steppers, 0000 (15 October 1982); doi: 10.1117/12.933680
Proc. SPIE 0342, Overlay Characterization Of Projection Aligners Using Electrical Probe Techniques, 0000 (15 October 1982); doi: 10.1117/12.933681
Proc. SPIE 0342, Electrical Test Methods For Evaluating Lithographic Processes And Equipment, 0000 (15 October 1982); doi: 10.1117/12.933682
Proc. SPIE 0342, Monitoring Wafer Stepper Performance With Electrical Test Structures, 0000 (15 October 1982); doi: 10.1117/12.933683
Proc. SPIE 0342, Temperature and Chemical Vapor Deposition (CVD) film effects on wafer flatness, 0000 (15 October 1982); doi: 10.1117/12.933684
Proc. SPIE 0342, Comparison Of Optical And Mechanical Methods Of Thickness Measurement, 0000 (15 October 1982); doi: 10.1117/12.933685
Proc. SPIE 0342, Thickness And Refractive Index Measurements By Light Coupling: Design Guidelines Of A Prism Coupler, 0000 (15 October 1982); doi: 10.1117/12.933686
Proc. SPIE 0342, Double Film Thickness Measurements In The Semiconductor Industry, 0000 (15 October 1982); doi: 10.1117/12.933687
Proc. SPIE 0342, Ellipsometric Accuracy And The Principal Angle Of Incidence, 0000 (15 October 1982); doi: 10.1117/12.933688
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