PROCEEDINGS VOLUME 0393
1983 MICROLITHOGRAPHY CONFERENCES | 14-15 MARCH 1983
Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II
IN THIS VOLUME

0 Sessions, 29 Papers, 0 Presentations
All Papers  (29)
1983 MICROLITHOGRAPHY CONFERENCES
14-15 March 1983
Santa Clara, United States
All Papers
Proc. SPIE 0393, Exposure Characteristics Of Electron Beam Resists For Synchrotron X-Ray Lithography, 0000 (7 November 1983); doi: 10.1117/12.935087
Proc. SPIE 0393, Multilayer Resist Systems Using Polysiloxanes As Etch Masks, 0000 (7 November 1983); doi: 10.1117/12.935088
Proc. SPIE 0393, Solid State Electron Beam Chemistry, 0000 (7 November 1983); doi: 10.1117/12.935089
Proc. SPIE 0393, Electron Beam Exposure Of GeSex, 0000 (7 November 1983); doi: 10.1117/12.935090
Proc. SPIE 0393, Options And Oportunities With Inorganic Photoresist Systems, 0000 (7 November 1983); doi: 10.1117/12.935091
Proc. SPIE 0393, Submicron Optical Lithography Using Inorganic Resists, 0000 (7 November 1983); doi: 10.1117/12.935092
Proc. SPIE 0393, Electron Beam Systems At IBM Status Report, 0000 (7 November 1983); doi: 10.1117/12.935093
Proc. SPIE 0393, Waferwriter: A Process-Compatible Electron Beam Direct Write System, 0000 (7 November 1983); doi: 10.1117/12.935094
Proc. SPIE 0393, Accurate Mark Position Detection In High Voltage Electron Beam Lithography, 0000 (7 November 1983); doi: 10.1117/12.935095
Proc. SPIE 0393, Submicron Lithography Radiation Damage In Silicon And Gallium Arsenide ICs, 0000 (7 November 1983); doi: 10.1117/12.935096
Proc. SPIE 0393, Theoretical Model For Photoelectron Transport In X-Ray Lithography Systems, 0000 (7 November 1983); doi: 10.1117/12.935097
Proc. SPIE 0393, Submicron X-Ray Replication Technology For Early Application, 0000 (7 November 1983); doi: 10.1117/12.935098
Proc. SPIE 0393, Status Of X-Ray Lithography At H-P, 0000 (7 November 1983); doi: 10.1117/12.935099
Proc. SPIE 0393, X-Ray Lithography Exposures Using Synchrotron Radiation, 0000 (7 November 1983); doi: 10.1117/12.935100
Proc. SPIE 0393, A Lithography System For X-Ray Process Development, 0000 (7 November 1983); doi: 10.1117/12.935101
Proc. SPIE 0393, X-Ray Lithography On Beam Line III-IV (3°) At SSRL, 0000 (7 November 1983); doi: 10.1117/12.935102
Proc. SPIE 0393, Liquid Metal Ion Sources For Lithography Some Recent Advances, 0000 (7 November 1983); doi: 10.1117/12.935103
Proc. SPIE 0393, Scanning Ion Beam Lithography For Sub-Micron Structure Fabrication, 0000 (7 November 1983); doi: 10.1117/12.935104
Proc. SPIE 0393, Ion-Optical System For Maskless Ion Implantation With 100 nm Resolution, 0000 (7 November 1983); doi: 10.1117/12.935105
Proc. SPIE 0393, A Focused Ion Beam System For The Generation Of Submicron Patterns, 0000 (7 November 1983); doi: 10.1117/12.935106
Proc. SPIE 0393, Maskless Fabrication Using Focused Ion Beams, 0000 (7 November 1983); doi: 10.1117/12.935107
Proc. SPIE 0393, Applications Of Focused Ion Beams, 0000 (7 November 1983); doi: 10.1117/12.935108
Proc. SPIE 0393, Status Of The Production Use Of Ion Implantation For IC Manufacture And Requirements For Competitive Application Of Focused Ion Beams, 0000 (7 November 1983); doi: 10.1117/12.935109
Proc. SPIE 0393, Submicron Electron Beam And Optical Lithography Using A Tri-Level Resist Scheme, 0000 (7 November 1983); doi: 10.1117/12.935110
Proc. SPIE 0393, Registration And Distortion Compensating Techniques For A Large Field X-Ray Exposure System, 0000 (7 November 1983); doi: 10.1117/12.935111
Proc. SPIE 0393, Influence Of Various Electro-Attractive Substituents On The Performances Of Acrylic Type Positive Resists In Microlithography., 0000 (7 November 1983); doi: 10.1117/12.935112
Proc. SPIE 0393, Optic And X-Ray Lithographies In 1990's, 0000 (7 November 1983); doi: 10.1117/12.935113
Proc. SPIE 0393, X-Ray Lithography Using Synchrotron Radiation And Ion-Beam Shadow Printing, 0000 (7 November 1983); doi: 10.1117/12.935114
Proc. SPIE 0393, Prospects For The 1:1 Electron Image Projector, 0000 (7 November 1983); doi: 10.1117/12.935115
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