PROCEEDINGS VOLUME 0394
1983 MICROLITHOGRAPHY CONFERENCES | 14-15 MARCH 1983
Optical Microlithography II: Technology for the 1980s
IN THIS VOLUME

0 Sessions, 28 Papers, 0 Presentations
All Papers  (28)
1983 MICROLITHOGRAPHY CONFERENCES
14-15 March 1983
Santa Clara, United States
All Papers
Proc. SPIE 0394, "Chemical Safety In The 1980s", 0000 (7 November 1983); doi: 10.1117/12.935117
Proc. SPIE 0394, Printing Sub-Micron Features Beyond The Normal Ootical Resolution Limit Using A Multi-Level Resist Technique, 0000 (7 November 1983); doi: 10.1117/12.935118
Proc. SPIE 0394, Contrast Enhancement - A Route To Submicron Optical Lithography, 0000 (7 November 1983); doi: 10.1117/12.935119
Proc. SPIE 0394, Germanium-Selenium (Ge-Se) Based Resist Systems For Submicron VLSI Application, 0000 (7 November 1983); doi: 10.1117/12.935120
Proc. SPIE 0394, A Two Layer Photoresist Process In A Production Environment, 0000 (7 November 1983); doi: 10.1117/12.935121
Proc. SPIE 0394, Manual Alignment Results Using The Perkin-Elmer M341 And Electron-Beam Masks, 0000 (7 November 1983); doi: 10.1117/12.935122
Proc. SPIE 0394, Overlay Performance Of The Perkin-Elmer Model 500, 0000 (7 November 1983); doi: 10.1117/12.935123
Proc. SPIE 0394, Image Matching: A Method For Overlay Error Reduction, 0000 (7 November 1983); doi: 10.1117/12.935124
Proc. SPIE 0394, Registration Analysis Of 1/10 Steppers, 1/1 Orojections And Their Hybrid, 0000 (7 November 1983); doi: 10.1117/12.935125
Proc. SPIE 0394, Image Placement Differences Between 1:1 Projection Aligners And 10:1 Reduction Wafer Steppers, 0000 (7 November 1983); doi: 10.1117/12.935126
Proc. SPIE 0394, VLSI Lithography Using Canon 1:1 Wafer Stepper, 0000 (7 November 1983); doi: 10.1117/12.935127
Proc. SPIE 0394, Deep Ultraviolet High Resolution Lithography, 0000 (7 November 1983); doi: 10.1117/12.935128
Proc. SPIE 0394, Performance Of Merck Selectilux P Positive Photoresist In Aluminium Plasma Etching And High Current Ion Implantation, 0000 (7 November 1983); doi: 10.1117/12.935129
Proc. SPIE 0394, New Positive Resist Designed For Use In The Mid Ultraviolet, 0000 (7 November 1983); doi: 10.1117/12.935130
Proc. SPIE 0394, Edge Sharpening, Contrast Enhancement, And Feature Dependent Amplification In Inorganic Resist - A Simulation Study, 0000 (7 November 1983); doi: 10.1117/12.935131
Proc. SPIE 0394, High Resolution Positive Resist Developers: A Technique Or Functional Evaluation And Process Optimization, 0000 (7 November 1983); doi: 10.1117/12.935132
Proc. SPIE 0394, Improved Novolak-Based Photoresist System For Very Large Scale Integration (VLSI) Lithography., 0000 (7 November 1983); doi: 10.1117/12.935133
Proc. SPIE 0394, A New Negative Resist For Deep UV Microlithography, 0000 (7 November 1983); doi: 10.1117/12.935135
Proc. SPIE 0394, Microlithography Techniques Using A Microwave Powered Deep UV Source, 0000 (7 November 1983); doi: 10.1117/12.935136
Proc. SPIE 0394, Impact Of Mask Defects On Integrated Circuits Yield, 0000 (7 November 1983); doi: 10.1117/12.935137
Proc. SPIE 0394, Yield Detraction In Simple Photoengraving, 0000 (7 November 1983); doi: 10.1117/12.935138
Proc. SPIE 0394, The Impact On Wafer Probe Yield Of Photomask Inspection Sensitivity, 0000 (7 November 1983); doi: 10.1117/12.935139
Proc. SPIE 0394, Direct Mask Overlay Inspection, 0000 (7 November 1983); doi: 10.1117/12.935140
Proc. SPIE 0394, Automated Chrome Blank Inspection: An Investigation Of Raw Plate Defects And Finished Photomask Quality, 0000 (7 November 1983); doi: 10.1117/12.935141
Proc. SPIE 0394, A Fully Automated Pattern Inspection System For Reticles & Masks, 0000 (7 November 1983); doi: 10.1117/12.935142
Proc. SPIE 0394, Automatic Inspection For In-Aligner Reticle Qualification, 0000 (7 November 1983); doi: 10.1117/12.935143
Proc. SPIE 0394, Wafer Pattern Defect Detection: An Automatic Inspection Technique, 0000 (7 November 1983); doi: 10.1117/12.935144
Proc. SPIE 0394, Automatic Wafer Inspection, 0000 (7 November 1983); doi: 10.1117/12.935145
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