PROCEEDINGS VOLUME 0469
1984 MICROLITHOGRAPHY CONFERENCES | 12-16 MARCH 1984
Advances in Resist Technology I
IN THIS VOLUME

0 Sessions, 24 Papers, 0 Presentations
All Papers  (24)
1984 MICROLITHOGRAPHY CONFERENCES
12-16 March 1984
Santa Clara, United States
All Papers
Proc. SPIE 0469, A High Sensitivity Two Layer Resist Process For Use In High Resolution Optical Lithography, 0000 (21 May 1984); doi: 10.1117/12.941770
Proc. SPIE 0469, Image Formation In The Sublayer Of A Multilayer Resist Structure, 0000 (21 May 1984); doi: 10.1117/12.941771
Proc. SPIE 0469, Polysilane Bilayer uv Lithography, 0000 (21 May 1984); doi: 10.1117/12.941772
Proc. SPIE 0469, An Improved Deep Ultra Violet (DUV) Multilayer Resist Process For High Resolution Lithography, 0000 (21 May 1984); doi: 10.1117/12.941773
Proc. SPIE 0469, Some Aspects Of Anti-Reflective Coating For Optical Lithography, 0000 (21 May 1984); doi: 10.1117/12.941774
Proc. SPIE 0469, Deep UV Positive Resists For Two-Level Photoresist Processes, 0000 (21 May 1984); doi: 10.1117/12.941775
Proc. SPIE 0469, Optical Performance And Process Characterizations Of Several High Contrast Metal-Ion-Free Developer Processes, 0000 (21 May 1984); doi: 10.1117/12.941776
Proc. SPIE 0469, Effect of Developer Composition on Photoresist Performance, 0000 (21 May 1984); doi: 10.1117/12.941777
Proc. SPIE 0469, Resolution Enhancement Of Positive Photoresist Through Optimization Of Thermal Processing, 0000 (21 May 1984); doi: 10.1117/12.941778
Proc. SPIE 0469, Thermolysis Of Positive Photoresists, 0000 (21 May 1984); doi: 10.1117/12.941779
Proc. SPIE 0469, Three Dimensional Microfabrication On Thick Film Photoresist Mandrels, 0000 (21 May 1984); doi: 10.1117/12.941780
Proc. SPIE 0469, A New Negative/High Resolution Photoresist WX-305, 0000 (21 May 1984); doi: 10.1117/12.941781
Proc. SPIE 0469, Application Of Contrast-Enhanced Lithography To 1:1 Projection Printing, 0000 (21 May 1984); doi: 10.1117/12.941782
Proc. SPIE 0469, Two-Dimensional Modeling Of Contrast-Enhanced Lithography, 0000 (21 May 1984); doi: 10.1117/12.941783
Proc. SPIE 0469, Contrast Enhanced UV Lithography With Polysilanes, 0000 (21 May 1984); doi: 10.1117/12.941784
Proc. SPIE 0469, Negative Photoresists For Deep-UV Lithography, 0000 (21 May 1984); doi: 10.1117/12.941785
Proc. SPIE 0469, High Resolution Polymer Pattern Fabrications With Low Energy Proton Beams, 0000 (21 May 1984); doi: 10.1117/12.941786
Proc. SPIE 0469, Novel, Negative-Working Electron-Beam Resist, 0000 (21 May 1984); doi: 10.1117/12.941787
Proc. SPIE 0469, Electron Beam Lithographic Evaluation And Chain Scissioning Yields Of Itaconate Resists, 0000 (21 May 1984); doi: 10.1117/12.941788
Proc. SPIE 0469, The Use Of Photoresists As Negative Electron Resists, 0000 (21 May 1984); doi: 10.1117/12.941789
Proc. SPIE 0469, A New High Temperature Positive Photoresist HX-256, 0000 (21 May 1984); doi: 10.1117/12.941790
Proc. SPIE 0469, High Contrast Photoresist For Use With Wafer Steppers, 0000 (21 May 1984); doi: 10.1117/12.941791
Proc. SPIE 0469, Trilayer Resist Processing Using Spin-On Glass Intermediate Layers, 0000 (21 May 1984); doi: 10.1117/12.941792
Proc. SPIE 0469, Image Reversal Techniques With Standard Positive Photoresist, 0000 (21 May 1984); doi: 10.1117/12.941793
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