PROCEEDINGS VOLUME 0471
1984 MICROLITHOGRAPHY CONFERENCES | 12-16 MARCH 1984
Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies III
IN THIS VOLUME

0 Sessions, 18 Papers, 0 Presentations
All Papers  (18)
1984 MICROLITHOGRAPHY CONFERENCES
12-16 March 1984
Santa Clara, United States
All Papers
Proc. SPIE 0471, Electron-Beam Lithography Error Sources, 0000 (18 June 1984); doi: 10.1117/12.942306
Proc. SPIE 0471, Enhanced Pattern Accuracy With Mebes III, 0000 (18 June 1984); doi: 10.1117/12.942308
Proc. SPIE 0471, Measurement And Inspection Of Contact Holes On In-Process Vlsi Devices With A Low. Voltage Scanning Electron Microscope (Sem), 0000 (18 June 1984); doi: 10.1117/12.942311
Proc. SPIE 0471, Retarding Field Optics For Practical Electron Beam Lithography, 0000 (18 June 1984); doi: 10.1117/12.942313
Proc. SPIE 0471, Si MOSFET Fabrication Using Focused Ion Beams, 0000 (18 June 1984); doi: 10.1117/12.942315
Proc. SPIE 0471, An Application Of Focused Ion Beams To Electron Beam Testing Of Integrated Circuits, 0000 (18 June 1984); doi: 10.1117/12.942318
Proc. SPIE 0471, Masked Ion Beam Lithography Using Stencil Masks, 0000 (18 June 1984); doi: 10.1117/12.942319
Proc. SPIE 0471, POLY(2,2,2-Trifluoroethyl A-Chloroacrylate) PTFECA, A High Sensitivity Ion Resist, 0000 (18 June 1984); doi: 10.1117/12.942321
Proc. SPIE 0471, Amorphous Silicon As An Inorganic Resist, 0000 (18 June 1984); doi: 10.1117/12.942323
Proc. SPIE 0471, Analysis Of The Energy Broadening Of Liquid Metal Ion Sources, 0000 (18 June 1984); doi: 10.1117/12.942325
Proc. SPIE 0471, Initial Operation Of A New High-Resolution Scanning Ion Microscope, 0000 (18 June 1984); doi: 10.1117/12.942327
Proc. SPIE 0471, Precision Alignment For X-Ray Lithography, 0000 (18 June 1984); doi: 10.1117/12.942329
Proc. SPIE 0471, Automatic X-Ray Alignment System For Submicron VLSI Printing, 0000 (18 June 1984); doi: 10.1117/12.942331
Proc. SPIE 0471, Dc Electroplating Of Sub-Micron Gold Patterns On X-Ray Masks, 0000 (18 June 1984); doi: 10.1117/12.942333
Proc. SPIE 0471, Characterization Techniques For X-Ray Lithography Submicron Metrology, 0000 (18 June 1984); doi: 10.1117/12.942335
Proc. SPIE 0471, Linewidth Control In X-Ray Lithography: The Influence Of The Penumbral Shadow, 0000 (18 June 1984); doi: 10.1117/12.942336
Proc. SPIE 0471, X-Ray Resist Characterization With Monochromatic Synchrotron Radiation, 0000 (18 June 1984); doi: 10.1117/12.942338
Proc. SPIE 0471, Defect Repair Techniques For X-Ray Masks, 0000 (18 June 1984); doi: 10.1117/12.942340
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