PROCEEDINGS VOLUME 0480
1984 TECHNICAL SYMPOSIUM EAST | 1-4 MAY 1984
Integrated Circuit Metrology II
IN THIS VOLUME

0 Sessions, 22 Papers, 0 Presentations
All Papers  (22)
1984 TECHNICAL SYMPOSIUM EAST
1-4 May 1984
Arlington, United States
All Papers
Proc. SPIE 0480, An Ellipsometry System For High Accuracy Metrology Of Thin Films, 0000 (15 October 1984); doi: 10.1117/12.943040
Proc. SPIE 0480, Infrared Ellipsometry On Silicon Wafers, 0000 (15 October 1984); doi: 10.1117/12.943041
Proc. SPIE 0480, Semiconductor Wafer Inspection, 0000 (15 October 1984); doi: 10.1117/12.943042
Proc. SPIE 0480, Photoresist Thickness Measurements Using Energy Dispersive X-Ray Spectroscopy, 0000 (15 October 1984); doi: 10.1117/12.943043
Proc. SPIE 0480, Optical Measurement Uncertainties And, Process Tolerances, 0000 (15 October 1984); doi: 10.1117/12.943044
Proc. SPIE 0480, Analysis Of Linewidth Measurement Techniques For The Purpose Of Automation., 0000 (15 October 1984); doi: 10.1117/12.943045
Proc. SPIE 0480, Aim-An Automated Inspection Microscope For Measuring Critical Dimensions, 0000 (15 October 1984); doi: 10.1117/12.943046
Proc. SPIE 0480, A New Technique For Linewidth Measurement On 1 Pm Geometry Process Wafers Using Fluorescence, 0000 (15 October 1984); doi: 10.1117/12.943047
Proc. SPIE 0480, A Fluorescent Linewidth Measurement System For Vlsi Fabrication, 0000 (15 October 1984); doi: 10.1117/12.943048
Proc. SPIE 0480, Optical Linewidth Measurement On Patterned Metal Layers, 0000 (15 October 1984); doi: 10.1117/12.943049
Proc. SPIE 0480, Fourier Transform Method For Optical Linewidth Measurement, 0000 (15 October 1984); doi: 10.1117/12.943050
Proc. SPIE 0480, A Double Pass Attachment For The Linear And Plane Mirror Interferometer, 0000 (15 October 1984); doi: 10.1117/12.943051
Proc. SPIE 0480, Precision Linewidth Measurement Using A Scanning Electron Microscope, 0000 (15 October 1984); doi: 10.1117/12.943052
Proc. SPIE 0480, Sem Metrology: Effects Due To Topography And Composition, 0000 (15 October 1984); doi: 10.1117/12.943053
Proc. SPIE 0480, Development Of Sem-Based Dedicated Ic Metrology System, 0000 (15 October 1984); doi: 10.1117/12.943054
Proc. SPIE 0480, Critical Dimension Measurement In The Scanning Electron Microscope, 0000 (15 October 1984); doi: 10.1117/12.943055
Proc. SPIE 0480, Application Of Electron - Optical Instruments For Measuring Small Pattern Features In Microlithography, 0000 (15 October 1984); doi: 10.1117/12.943056
Proc. SPIE 0480, Overlay Analysis Of Step-And-Repeat Lithographic Systems For Mask Making, 0000 (15 October 1984); doi: 10.1117/12.943057
Proc. SPIE 0480, Measurement Of Optical Performance Of Photolithographic Lenses, 0000 (15 October 1984); doi: 10.1117/12.943058
Proc. SPIE 0480, Direct-Write Electron Beam Patterning Reregistration And Metrology, 0000 (15 October 1984); doi: 10.1117/12.943059
Proc. SPIE 0480, Absolute 2-D Sub-Micron Metrology For Electron Beam Lithography, 0000 (15 October 1984); doi: 10.1117/12.943060
Proc. SPIE 0480, Moire Technique For Overlay Metrology, 0000 (15 October 1984); doi: 10.1117/12.943061
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