PROCEEDINGS VOLUME 0537
1985 MICROLITHOGRAPHY CONFERENCES | 11-14 MARCH 1985
Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV
IN THIS VOLUME

0 Sessions, 27 Papers, 0 Presentations
All Papers  (27)
1985 MICROLITHOGRAPHY CONFERENCES
11-14 March 1985
Santa Clara, United States
All Papers
Proc. SPIE 0537, E-Beam Tool Requirements For Nanolithography, 0000 (20 June 1985); doi: 10.1117/12.947478
Proc. SPIE 0537, Development of a Nanometric E-Beam Lithography System (JBX-5DII), 0000 (20 June 1985); doi: 10.1117/12.947479
Proc. SPIE 0537, Performance Testing Of The Waferwriter Tm Electron Beam Direct Write System, 0000 (20 June 1985); doi: 10.1117/12.947480
Proc. SPIE 0537, High Resolution E-Beam Lithography With The VLS-1000 Performance Of The Microseal Vacuum Interface, 0000 (20 June 1985); doi: 10.1117/12.947481
Proc. SPIE 0537, Measuring The Performance Of The AEBLE [sub]tm[/sub] 150 Direct-Write A-Beam Lithography Equipment, 0000 (20 June 1985); doi: 10.1117/12.947482
Proc. SPIE 0537, Digital Processing Of Beam Signals In A Variably Shaped Electron Beam Lithography System, 0000 (20 June 1985); doi: 10.1117/12.947483
Proc. SPIE 0537, The Time Has Come For X-Ray Lithography, 0000 (20 June 1985); doi: 10.1117/12.947484
Proc. SPIE 0537, A High Performance Negative X-Ray Resist : CPMS-X(Pd), 0000 (20 June 1985); doi: 10.1117/12.947485
Proc. SPIE 0537, Recent Printing And Registration Results With X-Ray Lithography, 0000 (20 June 1985); doi: 10.1117/12.947486
Proc. SPIE 0537, X-Ray Lithography At The Stanford Synchrotron Radiation Laboratory (SSRL), 0000 (20 June 1985); doi: 10.1117/12.947487
Proc. SPIE 0537, Submicron MOSFET Fabrication With X-Ray Lithography, 0000 (20 June 1985); doi: 10.1117/12.947488
Proc. SPIE 0537, X-Ray Lithography: Can It Be Justified, 0000 (20 June 1985); doi: 10.1117/12.947489
Proc. SPIE 0537, Bright Discharge Plasma Sources For X-Ray Lithography, 0000 (20 June 1985); doi: 10.1117/12.947490
Proc. SPIE 0537, Repair Of Photomasks With Focussed Ion Beams, 0000 (20 June 1985); doi: 10.1117/12.947491
Proc. SPIE 0537, Analytical Applications Of Focused Ion Beams, 0000 (20 June 1985); doi: 10.1117/12.947492
Proc. SPIE 0537, Liquid Metal Ion Sources For FIB Applications: Current Status And Future Prospects, 0000 (20 June 1985); doi: 10.1117/12.947493
Proc. SPIE 0537, Current Status Of Ion Projection Lithography, 0000 (20 June 1985); doi: 10.1117/12.947494
Proc. SPIE 0537, A Computer-Controlled Experimental FIB System, 0000 (20 June 1985); doi: 10.1117/12.947495
Proc. SPIE 0537, High Resolution, High Precision I-Line Stepper Processing, 0000 (20 June 1985); doi: 10.1117/12.947496
Proc. SPIE 0537, The Potential Of Optical Lithography, 0000 (20 June 1985); doi: 10.1117/12.947497
Proc. SPIE 0537, Recent Advances Of Optical Step-And-Repeat System, 0000 (20 June 1985); doi: 10.1117/12.947498
Proc. SPIE 0537, A Sub-Micron Electron Beam Lithography System For Laboratory Use, 0000 (20 June 1985); doi: 10.1117/12.947499
Proc. SPIE 0537, Multilayer Resist Systems For Optical And E-Beam Lithography, 0000 (20 June 1985); doi: 10.1117/12.947500
Proc. SPIE 0537, Submicron Pattern Fabrication By Focused Ion Beams, 0000 (20 June 1985); doi: 10.1117/12.947501
Proc. SPIE 0537, High Brightness Laser/Plasma Source For High Throughput Sub-Micron X-Ray Lithography, 0000 (20 June 1985); doi: 10.1117/12.947502
Proc. SPIE 0537, X-Ray Mask Technology, 0000 (20 June 1985); doi: 10.1117/12.947503
Proc. SPIE 0537, Contamination Lithography For The Fabrication Of Zone Plate X-Ray Lenses, 0000 (20 June 1985); doi: 10.1117/12.947504
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