PROCEEDINGS VOLUME 0632
1986 MICROLITHOGRAPHY CONFERENCES | 10-12 MARCH 1986
Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V
IN THIS VOLUME

0 Sessions, 33 Papers, 0 Presentations
All Papers  (33)
1986 MICROLITHOGRAPHY CONFERENCES
10-12 March 1986
Santa Clara, United States
All Papers
Proc. SPIE 0632, Practical Proximity Correction, 0000 (30 June 1986); doi: 10.1117/12.963662
Proc. SPIE 0632, Aeble 150 Performance In A Mix And Match Environment, 0000 (30 June 1986); doi: 10.1117/12.963663
Proc. SPIE 0632, Aeble-150 E-Beam/Optical Hybrid Lithography, 0000 (30 June 1986); doi: 10.1117/12.963664
Proc. SPIE 0632, Registration Mark Studying For High-Overlay-Accuracy Hybrid Lithography, 0000 (30 June 1986); doi: 10.1117/12.963665
Proc. SPIE 0632, Diffraction Grid Fabricated By Advanced Microelectronics Techniques For Hipparcos Astrometry Mission, 0000 (30 June 1986); doi: 10.1117/12.963666
Proc. SPIE 0632, Submicron Proximity Correction By The Fourier Precompensation Method, 0000 (30 June 1986); doi: 10.1117/12.963667
Proc. SPIE 0632, Maskless Etching Of Inp And Gaas By Means Of Ion Beam Assisted Etching, 0000 (30 June 1986); doi: 10.1117/12.963668
Proc. SPIE 0632, Fib Mask Repair With Microtrim, 0000 (30 June 1986); doi: 10.1117/12.963669
Proc. SPIE 0632, Influence Of Sputter Effects On The Resolution In X-Ray Mask Repair, 0000 (30 June 1986); doi: 10.1117/12.963670
Proc. SPIE 0632, The Nanofab-150-A Versatile New Focused-Ion-Beam System, 0000 (30 June 1986); doi: 10.1117/12.963671
Proc. SPIE 0632, FIB Microfabrication Software Design Considerations, 0000 (30 June 1986); doi: 10.1117/12.963672
Proc. SPIE 0632, Micron Features In III-V Materials By Photoelectrochemical Etching Of Focused Ion Beam Induced Damage Patterns, 0000 (30 June 1986); doi: 10.1117/12.963673
Proc. SPIE 0632, Submicron Mask Repair Using Focused Ion Beam Technology, 0000 (30 June 1986); doi: 10.1117/12.963674
Proc. SPIE 0632, Mask Technology For X-Ray Step-And-Repeat System, 0000 (30 June 1986); doi: 10.1117/12.963675
Proc. SPIE 0632, X-Ray Mask Distortion: Process And Pattern Dependence, 0000 (30 June 1986); doi: 10.1117/12.963676
Proc. SPIE 0632, Characteristics Of A Gas-Puff Z-Pinch Plasma X-Ray Source, 0000 (30 June 1986); doi: 10.1117/12.963677
Proc. SPIE 0632, Half Micron Cmos Device Fabrication Using Hybrid Lithography With X-Ray And Optical Steppers, 0000 (30 June 1986); doi: 10.1117/12.963678
Proc. SPIE 0632, Advanced X-Ray Alignment System, 0000 (30 June 1986); doi: 10.1117/12.963679
Proc. SPIE 0632, X-Ray Step-And-Repeat Lithography System For Submicron VLSI, 0000 (30 June 1986); doi: 10.1117/12.963680
Proc. SPIE 0632, Toward Submicron A New Phase Of Optical Stepper, 0000 (30 June 1986); doi: 10.1117/12.963681
Proc. SPIE 0632, Recent Progress On Submicron Electron Beam Lithography, 0000 (30 June 1986); doi: 10.1117/12.963682
Proc. SPIE 0632, Sub-100nm pattern fabrication in e-beam lithography, 0000 (30 June 1986); doi: 10.1117/12.963683
Proc. SPIE 0632, Novel Submicron Isolation Technique Of Gaas Active Layer Using Fibi-Mbe, 0000 (30 June 1986); doi: 10.1117/12.963684
Proc. SPIE 0632, Focused Ion Beam System For Submicron Lithography, 0000 (30 June 1986); doi: 10.1117/12.963685
Proc. SPIE 0632, Sub-Micron Pattern Inspection System Using Electron Beam, 0000 (30 June 1986); doi: 10.1117/12.963686
Proc. SPIE 0632, E-Beam Calibration Of The Hipparcos Grid Pattern, 0000 (30 June 1986); doi: 10.1117/12.963687
Proc. SPIE 0632, Scanning Electron Microscope (Sem) Dimensional Measurement Tool, 0000 (30 June 1986); doi: 10.1117/12.963688
Proc. SPIE 0632, Quantitative Voltage Measurement By A Software Closed Loop Technique In Electron Beam Testing, 0000 (30 June 1986); doi: 10.1117/12.963689
Proc. SPIE 0632, An Expansible EB System For Submicron Lithography, 0000 (30 June 1986); doi: 10.1117/12.963690
Proc. SPIE 0632, Application Of Ghost Proximity Effect Correction Method To Conventional And Nonswelling Negative E-Beam Resists, 0000 (30 June 1986); doi: 10.1117/12.963691
Proc. SPIE 0632, Metal Deposition By Electron Beam Exposure Of An Organometallic Film, 0000 (30 June 1986); doi: 10.1117/12.963692
Proc. SPIE 0632, A Simple, Compact, High Brightness Source For X-Ray Lithography And X-Ray Radiography, 0000 (30 June 1986); doi: 10.1117/12.963693
Proc. SPIE 0632, Fresnel Phase Effects For X-Ray Microlithography, 0000 (30 June 1986); doi: 10.1117/12.963694
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