PROCEEDINGS VOLUME 0633
1986 MICROLITHOGRAPHY CONFERENCES | 10-12 MARCH 1986
Optical Microlithography V
IN THIS VOLUME

0 Sessions, 40 Papers, 0 Presentations
All Papers  (40)
1986 MICROLITHOGRAPHY CONFERENCES
10-12 March 1986
Santa Clara, United States
All Papers
Proc. SPIE 0633, A Glimpse Into The Future Of Optical Lithography, 0000 (20 August 1986); doi: 10.1117/12.963696
Proc. SPIE 0633, Excimer Laser-Based Lithography: A Deep Ultraviolet Wafer Stepper, 0000 (20 August 1986); doi: 10.1117/12.963697
Proc. SPIE 0633, New Projection Lenses For Optical Stepper, 0000 (20 August 1986); doi: 10.1117/12.963698
Proc. SPIE 0633, Practical I-Line Lithography, 0000 (20 August 1986); doi: 10.1117/12.963699
Proc. SPIE 0633, A New Lens For Submicron Lithography And Its Consequences For Wafer Stepper Design, 0000 (20 August 1986); doi: 10.1117/12.963700
Proc. SPIE 0633, Where Is The Lost Resolution?, 0000 (20 August 1986); doi: 10.1117/12.963701
Proc. SPIE 0633, Excimer Laser Projection Patterning With And Without Resists: Submicrometer Etching Of Diamond And Diamond-Like Carbon Resist, 0000 (20 August 1986); doi: 10.1117/12.963702
Proc. SPIE 0633, Direct-Referencing Automatic Two-Points Reticle-To-Wafer Alignment Using A Projection Column Servo System, 0000 (20 August 1986); doi: 10.1117/12.963703
Proc. SPIE 0633, Relative Alignment By Direct Wafer Detection Utilizing Rocking Illumination Of Ar Ion Laser, 0000 (20 August 1986); doi: 10.1117/12.963704
Proc. SPIE 0633, Alignment Wavelength Optimization For Wafer Stepper Microscope, 0000 (20 August 1986); doi: 10.1117/12.963705
Proc. SPIE 0633, Fractured Alignment Mark Technology For Wafer Steppers, 0000 (20 August 1986); doi: 10.1117/12.963706
Proc. SPIE 0633, A Simple Method To Determine Alignment Tolerance In Photolithography Process, 0000 (20 August 1986); doi: 10.1117/12.963707
Proc. SPIE 0633, Electrical Methods For Precision Stepper Column Optimization, 0000 (20 August 1986); doi: 10.1117/12.963708
Proc. SPIE 0633, Characterization And Setup Techniques For A 5X Stepper, 0000 (20 August 1986); doi: 10.1117/12.963709
Proc. SPIE 0633, Mixing And Matching Of Wafer Steppers And Wafer Scanners For Cost-Effective, High-Volume Device Production, 0000 (20 August 1986); doi: 10.1117/12.963710
Proc. SPIE 0633, Impact Of 1X Reticle Defects For Submicron Production Lithography, 0000 (20 August 1986); doi: 10.1117/12.963711
Proc. SPIE 0633, Die-To-Database Inspection - An Effective Method Of Detecting And Locating Defects On Reticles, 0000 (20 August 1986); doi: 10.1117/12.963712
Proc. SPIE 0633, Design-Data Based Inspection Of Photomasks And Reticles, 0000 (20 August 1986); doi: 10.1117/12.963713
Proc. SPIE 0633, Mask Specs And Equipment Specs - Disparity And Reconciliation, 0000 (20 August 1986); doi: 10.1117/12.963714
Proc. SPIE 0633, Exposing Patterns With A Scanning Laser System, 0000 (20 August 1986); doi: 10.1117/12.963715
Proc. SPIE 0633, Removal Of Mask Registration Errors Using Full-Field Mask Aligners, 0000 (20 August 1986); doi: 10.1117/12.963716
Proc. SPIE 0633, Clear Defect Photolithographic Mask Repair In Open Air Using Laser-Induced Pyrolytic Decomposition, 0000 (20 August 1986); doi: 10.1117/12.963717
Proc. SPIE 0633, Controlling Etch Profiles: The Effect Of Controlling Ion Transport, 0000 (20 August 1986); doi: 10.1117/12.963718
Proc. SPIE 0633, Aluminum Taper Etching Using Resist/a-Si/Al Structure, 0000 (20 August 1986); doi: 10.1117/12.963719
Proc. SPIE 0633, Overview Of Dry-Etch Techniques, 0000 (20 August 1986); doi: 10.1117/12.963720
Proc. SPIE 0633, Planarization Profile Measurement Using A Confocal Scanning Laser Microscope, 0000 (20 August 1986); doi: 10.1117/12.963721
Proc. SPIE 0633, Renewed Energy For The Perkin-Elmer 140, 240, 340 Projection Printers, 0000 (20 August 1986); doi: 10.1117/12.963722
Proc. SPIE 0633, High Resolution Linewidth Control In Optical Microlithography, 0000 (20 August 1986); doi: 10.1117/12.963723
Proc. SPIE 0633, An Analysis Of The Relevance To Linewidth Control Of Various Aerial Image Characteristics, 0000 (20 August 1986); doi: 10.1117/12.963724
Proc. SPIE 0633, Detecting Straight Edge In General Partially Coherent Cases, 0000 (20 August 1986); doi: 10.1117/12.963725
Proc. SPIE 0633, A Concept For A High Resolution Optical Lithographic System For Producing One-Half Micron Linewidths, 0000 (20 August 1986); doi: 10.1117/12.963726
Proc. SPIE 0633, Two-Dimensional Optical Proximity Effects, 0000 (20 August 1986); doi: 10.1117/12.963727
Proc. SPIE 0633, Image Intensity Distribution Of Double Spaced Contact Holes, 0000 (20 August 1986); doi: 10.1117/12.963728
Proc. SPIE 0633, Simulations Of Optical Lithography Test Structures: Murray Daggers And Contact Arrays, 0000 (20 August 1986); doi: 10.1117/12.963729
Proc. SPIE 0633, Enhanced Performance Of Optical Lithography Using The DESIRE System, 0000 (20 August 1986); doi: 10.1117/12.963730
Proc. SPIE 0633, Elimination Of Mask-Induced Defects With Vote-Taking Lithography, 0000 (20 August 1986); doi: 10.1117/12.963731
Proc. SPIE 0633, Liquid Particle Counting Of Photoresists And Auxiliaries For Defect Control, 0000 (20 August 1986); doi: 10.1117/12.963732
Proc. SPIE 0633, Scanning Laser Technology Applied to High Speed Reticle Writing, 0000 (20 August 1986); doi: 10.1117/12.963733
Proc. SPIE 0633, A 10:1 Photomask Reduction Camera, 0000 (20 August 1986); doi: 10.1117/12.963734
Proc. SPIE 0633, STARR: Stepper Test Alignment Resolution Reticle For The Lithographic Characterization Of A Sub-Micron Stepper, 0000 (20 August 1986); doi: 10.1117/12.963735
Back to Top