PROCEEDINGS VOLUME 0771
MICROLITHOGRAPHY CONFERENCES | 2-6 MARCH 1987
Advances in Resist Technology and Processing IV
IN THIS VOLUME

0 Sessions, 44 Papers, 0 Presentations
All Papers  (44)
MICROLITHOGRAPHY CONFERENCES
2-6 March 1987
Santa Clara, CA, United States
All Papers
Proc. SPIE 0771, New Diazoketone Dissolution Inhibitors For Deep U.V. Photolithography, 0000 (25 August 1987); doi: 10.1117/12.940301
Proc. SPIE 0771, A Novel, Diazonium-Phenolic Resin Two-Layer Resist System Utilizing Photoinduced Interfacial Insolubilization, 0000 (25 August 1987); doi: 10.1117/12.940302
Proc. SPIE 0771, Brominated Poly(1-Trimethylsilylpropyne): A Sensitive Deep-Uv Resist For Two-Layer Lithography, 0000 (25 August 1987); doi: 10.1117/12.940303
Proc. SPIE 0771, Positive/Negative Mid Uv Resists With High Thermal Stability, 0000 (25 August 1987); doi: 10.1117/12.940304
Proc. SPIE 0771, Characteri Zation Cf A New Organ 3 Silicon Phcficiresist, 0000 (25 August 1987); doi: 10.1117/12.940305
Proc. SPIE 0771, Langmuir-Blodgett Films For Half Micron Lithography Using Krf Excimer Laser And X-Ray, 0000 (25 August 1987); doi: 10.1117/12.940306
Proc. SPIE 0771, High Temperature Photonegative Resists Based On Styrylpyridinium Units, 0000 (25 August 1987); doi: 10.1117/12.940307
Proc. SPIE 0771, Chemical Factors Affecting Npr Performance, 0000 (25 August 1987); doi: 10.1117/12.940308
Proc. SPIE 0771, A New Process For Contrast Enhancement Of Photoresist Patterns, 0000 (25 August 1987); doi: 10.1117/12.940309
Proc. SPIE 0771, The Mechanism Of The Desire Process, 0000 (25 August 1987); doi: 10.1117/12.940310
Proc. SPIE 0771, Highly Sensitized Electron-Beam Resist By Means Of A Quenching Process, 0000 (25 August 1987); doi: 10.1117/12.940311
Proc. SPIE 0771, Novolak Design For High Resolution Positive Photoresists, 0000 (25 August 1987); doi: 10.1117/12.940312
Proc. SPIE 0771, Dissolution And Swelling Studies Of Poly(Methyl Methacrylate) Resist Films, 0000 (25 August 1987); doi: 10.1117/12.940313
Proc. SPIE 0771, Mechanistic Study Of A Selective Gas-Phase Reactive Microlithographic System, 0000 (25 August 1987); doi: 10.1117/12.940314
Proc. SPIE 0771, Mechanism And Kinetics Of Silylation Of Resist Layers From The Gas Phase, 0000 (25 August 1987); doi: 10.1117/12.940315
Proc. SPIE 0771, Process Parameters For Submicron Electron Beam Lithography Of NPR, 0000 (25 August 1987); doi: 10.1117/12.940316
Proc. SPIE 0771, A Comparison Of The Dissolution Behavior Of Poly(P-Hydroxystyrene) With Novolac, 0000 (25 August 1987); doi: 10.1117/12.940317
Proc. SPIE 0771, On The Dissolution Kinetics Of Positive Photoresists: The Secondary Structure Model, 0000 (25 August 1987); doi: 10.1117/12.940318
Proc. SPIE 0771, A Study Of The Dissolution Kinetics 0? A Positive Photoresist Using Organic Acids To Simulate Exposed Photoactive Compounds, 0000 (25 August 1987); doi: 10.1117/12.940319
Proc. SPIE 0771, Effect Of Diffuse Reflectivity On Photoresist Linewidth Control, 0000 (25 August 1987); doi: 10.1117/12.940320
Proc. SPIE 0771, Processing Photostructural Materials, 0000 (25 August 1987); doi: 10.1117/12.940321
Proc. SPIE 0771, Computer Simulation Of The Percolational Development And Pattern Formation In Pulsed Laser Exposed Positive Photoresists, 0000 (25 August 1987); doi: 10.1117/12.940322
Proc. SPIE 0771, Enhancement Of Rie Resistance Of Conventional Resist Materials, 0000 (25 August 1987); doi: 10.1117/12.940323
Proc. SPIE 0771, Applications Of The Mold Controlled Profile (MCP) Technique For Resist Processing, 0000 (25 August 1987); doi: 10.1117/12.940324
Proc. SPIE 0771, Spin Coating And Planarization, 0000 (25 August 1987); doi: 10.1117/12.940325
Proc. SPIE 0771, New Principle For Image Enhancement In Single Layer Positive Photoresists, 0000 (25 August 1987); doi: 10.1117/12.940326
Proc. SPIE 0771, Sub-Halfmicron Negative Resist Systems By Image Reversal, 0000 (25 August 1987); doi: 10.1117/12.940327
Proc. SPIE 0771, A Practical Approach To Submicron Lithography, 0000 (25 August 1987); doi: 10.1117/12.940328
Proc. SPIE 0771, A Practical Approach To Lift-Off, 0000 (25 August 1987); doi: 10.1117/12.940329
Proc. SPIE 0771, Application Of Halogenated Polymethylstyrenes To X-Ray Resists, 0000 (25 August 1987); doi: 10.1117/12.940330
Proc. SPIE 0771, Lithographic Evaluation Of Copolymers With Enhanced Dry Etch Resistance, 0000 (25 August 1987); doi: 10.1117/12.940331
Proc. SPIE 0771, High Resolution Positive E-Beam Resist With Dry Etch Durability, 0000 (25 August 1987); doi: 10.1117/12.940332
Proc. SPIE 0771, Development Induction Mechanism In Novolak Based Resist Systems For Submicron Optical Lithography, 0000 (25 August 1987); doi: 10.1117/12.940333
Proc. SPIE 0771, New Pcm (HR-PCM) Technique Using Novolak-Diazide Type Photoresist As A Bottom Layer, 0000 (25 August 1987); doi: 10.1117/12.940334
Proc. SPIE 0771, Deep Uv And Thermal Hardening Of Novolak Resists, 0000 (25 August 1987); doi: 10.1117/12.940335
Proc. SPIE 0771, Applications Of Response Surface Methodology: I. A General And Practical Approach To Process Optimization, 0000 (25 August 1987); doi: 10.1117/12.940336
Proc. SPIE 0771, Resist Contrast Measurements Using A Development Rate Monitor, 0000 (25 August 1987); doi: 10.1117/12.940337
Proc. SPIE 0771, Linewidth Uniformity: A Critical Evaluation Of Spray Geometry And Process Interactions In Ultrasonic Nozzles, 0000 (25 August 1987); doi: 10.1117/12.940338
Proc. SPIE 0771, Optimized Tri-Layer Resist Technique For Volume Production, 0000 (25 August 1987); doi: 10.1117/12.940339
Proc. SPIE 0771, Negative-Acting Aqueous Base-Developable Photoresist With Submicron Resolution Capabilities Over Topography, 0000 (25 August 1987); doi: 10.1117/12.940340
Proc. SPIE 0771, Dynalith ® Resists For Mid-Uv Applications: * Formulation Optimization For Gaas Related Processing, 0000 (25 August 1987); doi: 10.1117/12.940341
Proc. SPIE 0771, An Improved Technique For 1/4 Micrometer Gate Length Gaas Mesfet Fabrication By Optical Lithography, 0000 (25 August 1987); doi: 10.1117/12.940342
Proc. SPIE 0771, Oxygen Reactive Ion Etching For Multilevel Lithography, 0000 (25 August 1987); doi: 10.1117/12.940343
Proc. SPIE 0771, High Resolution Positive Photoresist For Submicron Photolithography, 0000 (25 August 1987); doi: 10.1117/12.940344
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