PROCEEDINGS VOLUME 0773
MICROLITHOGRAPHY CONFERENCES | 2-6 MARCH 1987
Electron-Beam, X-Ray, and Ion-Beam Lithographies VI
IN THIS VOLUME

0 Sessions, 34 Papers, 0 Presentations
All Papers  (34)
MICROLITHOGRAPHY CONFERENCES
2-6 March 1987
Santa Clara, CA, United States
All Papers
Proc. SPIE 0773, An X-Ray Stepper For Production Lithography, 0000 (30 June 1987); doi: 10.1117/12.940346
Proc. SPIE 0773, A New Mask-To-Wafer Alignment Technique For Synchrotron Radiation X-Ray Lithography, 0000 (30 June 1987); doi: 10.1117/12.940347
Proc. SPIE 0773, Status And Prospects Of Sic-Masks For Synchrotron Based X-Ray Lithography, 0000 (30 June 1987); doi: 10.1117/12.940348
Proc. SPIE 0773, Versatile X-Ray Mask Fabrication Techniques, 0000 (30 June 1987); doi: 10.1117/12.940349
Proc. SPIE 0773, A Model For Optimal Beamline Design For Synchrotron Radiation X-Ray Lithography, 0000 (30 June 1987); doi: 10.1117/12.940350
Proc. SPIE 0773, Transition Radiation As An X-Ray Source For Lithography, 0000 (30 June 1987); doi: 10.1117/12.940351
Proc. SPIE 0773, High Throughput And Accuracy X-Ray Stepper With Plasma Source, 0000 (30 June 1987); doi: 10.1117/12.940352
Proc. SPIE 0773, A Hybrid E-Beam/Deep-Uv Lithography For Gaas Fet's, 0000 (30 June 1987); doi: 10.1117/12.940353
Proc. SPIE 0773, An Improved Technique For 1/4 Micrometer Gate Length Gaas Mesfet Fabrication By Optical Lithography, 0000 (30 June 1987); doi: 10.1117/12.940354
Proc. SPIE 0773, Dynalith® Resists For Mid-Uv Applications: Formulation Optimization For Gaas Related Processing, 0000 (30 June 1987); doi: 10.1117/12.940355
Proc. SPIE 0773, Direct-Write Electron Beam Lithography For Integrated Circuits: Submicron Image Reversal Process Of Novolac-Diazo Resist And Its Stability Towards Composite Metallization In Bipolar Gate Arrays For Vlsi, 0000 (30 June 1987); doi: 10.1117/12.940356
Proc. SPIE 0773, Optimized Tri-Layer Resist Technique For Volume Production, 0000 (30 June 1987); doi: 10.1117/12.940357
Proc. SPIE 0773, Oxidation As A Major Cause Of Defects In Electron-Beam And Optical Resists, 0000 (30 June 1987); doi: 10.1117/12.940358
Proc. SPIE 0773, Lower Defect Photomasks Using Focused Ion Beam (Fib) Repair, 0000 (30 June 1987); doi: 10.1117/12.940359
Proc. SPIE 0773, Electron-Beam Reticle Writing System For 16M Dram Class Devices, 0000 (30 June 1987); doi: 10.1117/12.940360
Proc. SPIE 0773, Production Efficiency And Intensity Distribution Of Pd X-Ray Source For Lithography, 0000 (30 June 1987); doi: 10.1117/12.940361
Proc. SPIE 0773, X-Ray Induced Damage In Boron Nitride, Silicon, And Silicon Nitride Lithography Masks, 0000 (30 June 1987); doi: 10.1117/12.940362
Proc. SPIE 0773, Aqueous Base Developed, Single Level Resist For Submicron X-Ray Lithography, 0000 (30 June 1987); doi: 10.1117/12.940363
Proc. SPIE 0773, Adaptive Discretionary Wiring For Wafer Scale Integration Using Electron Beam Lithography, 0000 (30 June 1987); doi: 10.1117/12.940364
Proc. SPIE 0773, E-Beam Exposure Of Optical Resist For Mask Lithography, 0000 (30 June 1987); doi: 10.1117/12.940365
Proc. SPIE 0773, Direct Patterning Of Polyimide By Pulsed Electron Beams In Soft Vacuum, 0000 (30 June 1987); doi: 10.1117/12.940366
Proc. SPIE 0773, Response Surfaces As A Tool For Optimizing Proximity Corrections, 0000 (30 June 1987); doi: 10.1117/12.940367
Proc. SPIE 0773, A Proximity Effect Measuring Test Chip - Design And Application, 0000 (30 June 1987); doi: 10.1117/12.940368
Proc. SPIE 0773, Sub-Half Micrometer Resist Processes For The Aeble-150, 0000 (30 June 1987); doi: 10.1117/12.940369
Proc. SPIE 0773, A Second Generation Focused Ion Beam Micromachining System, 0000 (30 June 1987); doi: 10.1117/12.940370
Proc. SPIE 0773, 10 Nm Fabrication By Focused Ion Beam, 0000 (30 June 1987); doi: 10.1117/12.940371
Proc. SPIE 0773, Advances In Focused-Ion-Beam Repair Techniques, 0000 (30 June 1987); doi: 10.1117/12.940372
Proc. SPIE 0773, Optimized Focused Ion Beam Inspection And Repair Of Wafer Scale Interconnections, 0000 (30 June 1987); doi: 10.1117/12.940373
Proc. SPIE 0773, Advanced Mask Repair With The Nanofix, 0000 (30 June 1987); doi: 10.1117/12.940374
Proc. SPIE 0773, Submicron Optical Lithography Using A KrF Excimer Laser Projection Exposure System, 0000 (30 June 1987); doi: 10.1117/12.940375
Proc. SPIE 0773, A High Speed Nanometric Electron Beam Lithography System, 0000 (30 June 1987); doi: 10.1117/12.940376
Proc. SPIE 0773, Achievements Of Recent Research In Focused-Ion-Beam Technology, 0000 (30 June 1987); doi: 10.1117/12.940377
Proc. SPIE 0773, Laser Plasma X-Ray Source For Lithography, 0000 (30 June 1987); doi: 10.1117/12.940378
Proc. SPIE 0773, Development Of Compact Synchrotron Radiation Ring For X-Ray Lithography, 0000 (30 June 1987); doi: 10.1117/12.940379
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