PROCEEDINGS VOLUME 0922
SANTA CLARA SYMPOSIUM ON MICROLITHOGRAPHY | 2-4 MARCH 1988
Optical/Laser Microlithography
IN THIS VOLUME

0 Sessions, 53 Papers, 0 Presentations
All Papers  (53)
SANTA CLARA SYMPOSIUM ON MICROLITHOGRAPHY
2-4 March 1988
Santa Clara, CA, United States
All Papers
Proc. SPIE 0922, Masks For Sub - 0.5µm Optical Lithography, 0000 (1 January 1988); doi: 10.1117/12.968396
Proc. SPIE 0922, Submicrometer Pattern Correction For Optical Lithography, 0000 (1 January 1988); doi: 10.1117/12.968397
Proc. SPIE 0922, High-Resolution Imaging Using Focused-Image Holography With Wave-Front Conjugation, 0000 (1 January 1988); doi: 10.1117/12.968398
Proc. SPIE 0922, Use Of Carbonized Photoresist For Optical Mask Repair, 0000 (1 January 1988); doi: 10.1117/12.968399
Proc. SPIE 0922, New Advances In Reticle Qualification Techniques, 0000 (1 January 1988); doi: 10.1117/12.968400
Proc. SPIE 0922, Through-The-Lens Automatic Focusing And Leveling In An Advanced Mask Stepper, 0000 (1 January 1988); doi: 10.1117/12.968401
Proc. SPIE 0922, Image Quality Enhancements For Raster Scan Lithography, 0000 (1 January 1988); doi: 10.1117/12.968402
Proc. SPIE 0922, High Precision Alignment Stage For Micro Lithography, 0000 (1 January 1988); doi: 10.1117/12.968403
Proc. SPIE 0922, Enhanced Global Alignment For Production Optical Lithography, 0000 (1 January 1988); doi: 10.1117/12.968404
Proc. SPIE 0922, Overlay Tolerances For Vlsi Using Wafer Steppers, 0000 (1 January 1988); doi: 10.1117/12.968405
Proc. SPIE 0922, Overlay Simulator For Wafer Steppers, 0000 (1 January 1988); doi: 10.1117/12.968406
Proc. SPIE 0922, Condenser Aberrations In Kohler Illumination, 0000 (1 January 1988); doi: 10.1117/12.968407
Proc. SPIE 0922, Understanding Focus Effects In Submicron Optical Lithography, 0000 (1 January 1988); doi: 10.1117/12.968408
Proc. SPIE 0922, Modeling High Numerical Aperture Optical Lithography, 0000 (1 January 1988); doi: 10.1117/12.968409
Proc. SPIE 0922, Polarization Dependence Of Diffraction By High Resolution Masks, 0000 (1 January 1988); doi: 10.1117/12.968410
Proc. SPIE 0922, Resolution And Proximity Effect In Optical Lithography, 0000 (1 January 1988); doi: 10.1117/12.968411
Proc. SPIE 0922, Seamless Stitching For Large Area Integrated Circuit Manufacturing, 0000 (1 January 1988); doi: 10.1117/12.968412
Proc. SPIE 0922, Characterization Of Voting Suppression Of Optical Defects Through Simulation, 0000 (1 January 1988); doi: 10.1117/12.968413
Proc. SPIE 0922, The Use Of DRM Method(s) To Establish Wafer Fab Procedures Requiring Dyed Positive Photoresists, 0000 (1 January 1988); doi: 10.1117/12.968414
Proc. SPIE 0922, Measuring Photoresist Spectral Response With A Spectrosensitometer, 0000 (1 January 1988); doi: 10.1117/12.968415
Proc. SPIE 0922, The Use Of A Non-Actinic Dye In A Conventional Positive Photoresist For Improved Target Alignment In The Dark Field Mode, 0000 (1 January 1988); doi: 10.1117/12.968416
Proc. SPIE 0922, New Portable Conformable Mask Method For Excimer Laser Lithography, 0000 (1 January 1988); doi: 10.1117/12.968417
Proc. SPIE 0922, Optical-Diffraction-Based Modulation Of Photoresist Profile For Microlithography Applications. The "Optical" Tapering Of Contacts And Vias., 0000 (1 January 1988); doi: 10.1117/12.968418
Proc. SPIE 0922, Subhalfmicronic Contact Printing Lithography Using A Microwave Powered Deep UV Source, 0000 (1 January 1988); doi: 10.1117/12.968419
Proc. SPIE 0922, Simulation Of Proximity Printing, 0000 (1 January 1988); doi: 10.1117/12.968420
Proc. SPIE 0922, Single-Step, Positive-Tone, Lift-Off Process Using AZ 5214-E Resist, 0000 (1 January 1988); doi: 10.1117/12.968421
Proc. SPIE 0922, The Paths To Subhalf-Micrometer Optical Lithography, 0000 (1 January 1988); doi: 10.1117/12.968423
Proc. SPIE 0922, The Optical Stepper With A High Numerical Aperture I-Line Lens And A Field-By-Field Leveling System, 0000 (1 January 1988); doi: 10.1117/12.968424
Proc. SPIE 0922, Resolution And Overlay Of Submicron I-Line Wafer Steppers, 0000 (1 January 1988); doi: 10.1117/12.968425
Proc. SPIE 0922, The Future Of Projection Lenses And The New G-Line Lens For 0.7 µm Lithography, 0000 (1 January 1988); doi: 10.1117/12.968426
Proc. SPIE 0922, Routes To Half-Micron Lithography, 0000 (1 January 1988); doi: 10.1117/12.968427
Proc. SPIE 0922, Submicron Imaging Capabilities Of A 0.40 na Broadband Optical System, 0000 (1 January 1988); doi: 10.1117/12.968428
Proc. SPIE 0922, New 5X i-Line Projection Aligner For VLSI Fabrication, 0000 (1 January 1988); doi: 10.1117/12.968429
Proc. SPIE 0922, High-Resolution Imagery: The Matching Of Optical And Resist Systems In The Mid-UV, 0000 (1 January 1988); doi: 10.1117/12.968430
Proc. SPIE 0922, 0.5µm Lithography Using A G-Line Stepper With A 0.6 Numerical Aperture Lens., 0000 (1 January 1988); doi: 10.1117/12.968431
Proc. SPIE 0922, A Submicron Lithography Process Using Philips I-Line Stepper, 0000 (1 January 1988); doi: 10.1117/12.968432
Proc. SPIE 0922, Analysis Of A Submicron I-Line Pilot Process, 0000 (1 January 1988); doi: 10.1117/12.968433
Proc. SPIE 0922, A Stepper Image Monitor For Precise Setup And Characterization, 0000 (1 January 1988); doi: 10.1117/12.968434
Proc. SPIE 0922, Bench Evaluation Of Lithographic Lenses From Measurements Of The Point Spread Function, 0000 (1 January 1988); doi: 10.1117/12.968435
Proc. SPIE 0922, Characterization Of A Submicron Image Reversal Process, 0000 (1 January 1988); doi: 10.1117/12.968436
Proc. SPIE 0922, Performance Of A KrF Excimer Laser Stepper, 0000 (1 January 1988); doi: 10.1117/12.968437
Proc. SPIE 0922, An Advanced KrF Excimer Laser Stepper For Production Of 16MDRAMs, 0000 (1 January 1988); doi: 10.1117/12.968438
Proc. SPIE 0922, Excimer Laser Photolithography With 1:1 Wynne-Dyson Optics, 0000 (1 January 1988); doi: 10.1117/12.968439
Proc. SPIE 0922, Optical Pattern Generator Using Excimer Laser, 0000 (1 January 1988); doi: 10.1117/12.968440
Proc. SPIE 0922, Combination Of Narrow Bandwidth Excimer Laser And Monochromatic Reduction Projection Lens, 0000 (1 January 1988); doi: 10.1117/12.968441
Proc. SPIE 0922, Exposure Dose Control Techniques For Excimer Laser Lithography, 0000 (1 January 1988); doi: 10.1117/12.968442
Proc. SPIE 0922, Effect Of Temporal And Spatial Coherence Of Light Source On Patterning Characteristics In KrF Excimer Laser Lithography, 0000 (1 January 1988); doi: 10.1117/12.968443
Proc. SPIE 0922, Computerized Wavelength Stabilized 248.4 Nm Excimer Laser For Stepper, 0000 (1 January 1988); doi: 10.1117/12.968444
Proc. SPIE 0922, The Design Of Excimer Lasers For Use In Microlithography, 0000 (1 January 1988); doi: 10.1117/12.968445
Proc. SPIE 0922, Chromium Mask Damage In Excimer Laser Projection Processing, 0000 (1 January 1988); doi: 10.1117/12.968446
Proc. SPIE 0922, Excimer Projection Lithography At 193-nm Wavelength, 0000 (1 January 1988); doi: 10.1117/12.968447
Proc. SPIE 0922, A Compact Optical Imaging System For Resist Process And Lithography Research, 0000 (1 January 1988); doi: 10.1117/12.968448
Proc. SPIE 0922, Sub-Micron Lithography At 248nm And 193nm Excimer Laser Wavelengths, 0000 (1 January 1988); doi: 10.1117/12.968449
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