PROCEEDINGS VOLUME 0923
MEDICAL IMAGING II | JAN 31 - FEB 5 1988
Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII
IN THIS VOLUME

0 Sessions, 38 Papers, 0 Presentations
All Papers  (38)
MEDICAL IMAGING II
Jan 31 - Feb 5 1988
Newport Beach, CA, United States
All Papers
Proc. SPIE 0923, Low Distortion X-Ray Mask With W-Ti Absorber, 0000 (14 June 1988); doi: 10.1117/12.945626
Proc. SPIE 0923, Application Of Sic-X-Ray Masks For Fabricating Sub-Micron Devices, 0000 (14 June 1988); doi: 10.1117/12.945627
Proc. SPIE 0923, X Ray Mask Of Gold-Carbon Mixture Absorber On BCN Compound Substrate Fabricated By Plasma Processes, 0000 (14 June 1988); doi: 10.1117/12.945628
Proc. SPIE 0923, Microlithography Using A Laser Plasma Created X-Ray Source, 0000 (14 June 1988); doi: 10.1117/12.945629
Proc. SPIE 0923, Application And Analysis Of Production Suitability Of A Laser-Based Plasma X-Ray Stepper, 0000 (14 June 1988); doi: 10.1117/12.945630
Proc. SPIE 0923, Compact SR Light Source For X-Ray Lithography, 0000 (14 June 1988); doi: 10.1117/12.945631
Proc. SPIE 0923, Fabrication Of 0.5 µm Poly-Si And Aluminum Interconnections By Means Of X-Ray Lithography And Plasma Etching, 0000 (14 June 1988); doi: 10.1117/12.945632
Proc. SPIE 0923, New Energy-Dependent Soft X-Rav Damage In MOS Devices, 0000 (14 June 1988); doi: 10.1117/12.945633
Proc. SPIE 0923, Focused Ion Beam Microfabrication, 0000 (14 June 1988); doi: 10.1117/12.945634
Proc. SPIE 0923, Practical Technologies For FIB Direct-Writing Applications, 0000 (14 June 1988); doi: 10.1117/12.945635
Proc. SPIE 0923, Microcircuit Modification Using Focused Ion Beams, 0000 (14 June 1988); doi: 10.1117/12.945636
Proc. SPIE 0923, A Focusing Column For A Low Energy Focused Ion Beam Instrument, 0000 (14 June 1988); doi: 10.1117/12.945637
Proc. SPIE 0923, Ultrathin MBE-Grown Semiconductor Layer Masks For Focused Ga-Ion Beam Lithography, 0000 (14 June 1988); doi: 10.1117/12.945638
Proc. SPIE 0923, Hybrid Device Process Using A Focused Ion Beam And An Optical Stepper, 0000 (14 June 1988); doi: 10.1117/12.945639
Proc. SPIE 0923, Recent Progress On Etching Technology With Fib In Photomask Repair, 0000 (14 June 1988); doi: 10.1117/12.945640
Proc. SPIE 0923, Design Of A New, Two Lens Ion Gun For Micromachining, 0000 (14 June 1988); doi: 10.1117/12.945641
Proc. SPIE 0923, Contrast And Sensitivity Trade-Offs Of Resist Processing In Electron Beam Lithography At 0.5,U,M And Below, 0000 (14 June 1988); doi: 10.1117/12.945642
Proc. SPIE 0923, Enhancement Of Mp 2400 Resist Contrast Using Immersion Development, 0000 (14 June 1988); doi: 10.1117/12.945643
Proc. SPIE 0923, Submicron E-Beam Lithography Utilizing A Positive Novolac-Based Resist, 0000 (14 June 1988); doi: 10.1117/12.945644
Proc. SPIE 0923, High Resolution, Novolak Based Negative Tone Electron Beam Resist, 0000 (14 June 1988); doi: 10.1117/12.945645
Proc. SPIE 0923, Nanolithography With Poly(3-Butenyltrimethylsilane Sulfone), 0000 (14 June 1988); doi: 10.1117/12.945646
Proc. SPIE 0923, Design Consideration Of A Radiation Cooled Slotted Rotating Target X-Ray Source, 0000 (14 June 1988); doi: 10.1117/12.945647
Proc. SPIE 0923, Novel Process For Fabricating Low Distortion X-Ray Masks Of Submicron Gold Patterns, 0000 (14 June 1988); doi: 10.1117/12.945649
Proc. SPIE 0923, Sub-Half Micrometer Gate Lift-Off By Three Layer Resist Process Via Electron Beam Lithography For Gallium Arsenide Monolithic Microwave Integrated Circuits (MIMICs), 0000 (14 June 1988); doi: 10.1117/12.945650
Proc. SPIE 0923, Application Of Vector Scan E-Beam Lithography In Fabrication Of Gaas Devices, 0000 (14 June 1988); doi: 10.1117/12.945651
Proc. SPIE 0923, Transformation Of Pattern Personality In E-Beam Lithography : A Conceptual Approach, 0000 (14 June 1988); doi: 10.1117/12.945652
Proc. SPIE 0923, High Resolution Trilayer Electron Beam Resist System Employing P[Mma/Maa] And Reliable Reactive Ion Etch Processes, 0000 (14 June 1988); doi: 10.1117/12.945653
Proc. SPIE 0923, A New Electron Beam/Deep Ultra Violet (EB/DUV) Cyanoacrylate Resist Technology, 0000 (14 June 1988); doi: 10.1117/12.945654
Proc. SPIE 0923, Electron-beam direct write on gate arrays, 0000 (14 June 1988); doi: 10.1117/12.945655
Proc. SPIE 0923, Fully Scaled 0.5 Micron CMOS Technology Using Variable Shaped Electron Beam Lithography, 0000 (14 June 1988); doi: 10.1117/12.945656
Proc. SPIE 0923, High Speed Data Control Circuit For Nanometric Electron Beam Lithography, 0000 (14 June 1988); doi: 10.1117/12.945657
Proc. SPIE 0923, Reproducibility And Yield Study Of Electron-Beam-Generated Quarter-Micron And Sub-Quarter-Micron Gate-Length GaAs Fets, 0000 (14 June 1988); doi: 10.1117/12.945658
Proc. SPIE 0923, A Simple Metal Pn Polymer Process Using Pulsed Electron Beams In Soft Vacuum, 0000 (14 June 1988); doi: 10.1117/12.945659
Proc. SPIE 0923, Electron Beam/Optical Hybrid Lithography For The Production Of Gallium Arsenide Monolithic Microwave Integrated Circuits (Mimics), 0000 (14 June 1988); doi: 10.1117/12.945660
Proc. SPIE 0923, Automatic Column Set-Up For High Speed E-Beam Pattern Generators., 0000 (14 June 1988); doi: 10.1117/12.945661
Proc. SPIE 0923, An E-Beam Direct Write Process For Half Micron DRAMS, 0000 (14 June 1988); doi: 10.1117/12.945662
Proc. SPIE 0923, Improvements In The JBX-6AIII Series Of Shaped Beam Lithography Tools, 0000 (14 June 1988); doi: 10.1117/12.945663
Proc. SPIE 0923, 0.50 µm Direct Write Gate Lithography For Selectively Doped Heterostructure Transistor Devices, 0000 (14 June 1988); doi: 10.1117/12.945664
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