Using the Data
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Illumination pupil optimization in 0.33NA EUVL by intensity balancing for semi-iso dark field two-bar M1 building blocks
Anamorphic imaging at high-NA EUV: mask error factor and interaction between demagnification and lithographic metrics
Critical dimension uniformity characterization of nanoimprinted trenches for high volume manufacturing qualification
Combination of direct laser writing and soft lithography molds for combined nano- and microfabrication