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Improvements in the imaging performance of a high volume manufacturing EUV scanner with a special emphasis on the added value of the new illuminator for increased pupil flexibility
Challenges for scanning electron microscopy and inspection on the nanometer scale for non-IC application: and how to tackle them using computational techniques
Challenges of nanostructure-integration in Fabry-Pérot interferometers as alternative to Bragg reflectors: an example for Match 1:1-, eBeam-, and nanoimprint lithography
Line edge roughness measurement through SEM images: effects of image digitization and their mitigation
New overlay measurement technique with an i-line stepper using embedded standard field image alignment marks for wafer bonding applications
Experimental verification of sub-wavelength holographic lithography physical concept for single exposure fabrication of complex structures on planar and nonplanar surfaces
Depth-profiling of vertical material contrast after VUV exposure for contact-free polishing of 3D polymer micro-optics