PROCEEDINGS VOLUME 1088
1989 SANTA CLARA SYMPOSIUM ON MICROLITHOGRAPHY | FEB 27 - MAR 3 1989
Optical/Laser Microlithography II
IN THIS VOLUME

0 Sessions, 53 Papers, 0 Presentations
All Papers  (53)
1989 SANTA CLARA SYMPOSIUM ON MICROLITHOGRAPHY
Feb 27 - Mar 3 1989
San Jose, CA, United States
All Papers
Proc. SPIE 1088, Photomask Limitations And Directions, 0000 (25 July 1989); doi: 10.1117/12.953129
Proc. SPIE 1088, A Comparison of Optical Gaussian Beam Lithography with Conventional E-beam and Optical Lithography, 0000 (25 July 1989); doi: 10.1117/12.953130
Proc. SPIE 1088, 0.3-micron Optical Lithography Using A Phase-Shifting Mask, 0000 (25 July 1989); doi: 10.1117/12.953131
Proc. SPIE 1088, Use Of A Single Size Square Serif For Variable Print Bias Compensation In Microlithography: Method, Design, And Practice, 0000 (25 July 1989); doi: 10.1117/12.953132
Proc. SPIE 1088, Effects Of Subhalf Micron Mask Defects On Wafer Images During VLSI Circuit Production, 0000 (25 July 1989); doi: 10.1117/12.953133
Proc. SPIE 1088, Effect of Stepper Resolution on the Printability of Submicron 5x Reticle Defects, 0000 (25 July 1989); doi: 10.1117/12.953134
Proc. SPIE 1088, Development And Implementation Of A Laser-Induced Gold Deposition Technique For Repair Of Chromium Photomasks, 0000 (25 July 1989); doi: 10.1117/12.953135
Proc. SPIE 1088, Exploratory Test Structures for Image Evaluation in Optical Projection Printing, 0000 (25 July 1989); doi: 10.1117/12.953137
Proc. SPIE 1088, Resist Pattern Analysis For Submicron Feature Size Using 3-D Photolithography Simulator, 0000 (25 July 1989); doi: 10.1117/12.953138
Proc. SPIE 1088, Vibration Tolerance in Optical Imaging, 0000 (25 July 1989); doi: 10.1117/12.953139
Proc. SPIE 1088, Rapid Optimization Of The Lithographic Process Window, 0000 (25 July 1989); doi: 10.1117/12.953140
Proc. SPIE 1088, Quantitative Evaluation Method at Conjugate Point for Practical Resolution of Wafer Stepper, 0000 (25 July 1989); doi: 10.1117/12.953141
Proc. SPIE 1088, The Design, Characterization, and Implementation of a One Micron Lithography Process in a High Volume Manufacturing Line, 0000 (25 July 1989); doi: 10.1117/12.953142
Proc. SPIE 1088, Lithographic Process Development for High Numerical Aperture I-Line Steppers, 0000 (25 July 1989); doi: 10.1117/12.953143
Proc. SPIE 1088, New-Generation Optical Stepper With High N.A. g-Line Lens, 0000 (25 July 1989); doi: 10.1117/12.953144
Proc. SPIE 1088, New g-Line Lens For Next Generation, 0000 (25 July 1989); doi: 10.1117/12.953145
Proc. SPIE 1088, New I-Line Lenses, 0000 (25 July 1989); doi: 10.1117/12.953146
Proc. SPIE 1088, Progress in I-line Stepper Technology for Half-Micron, 0000 (25 July 1989); doi: 10.1117/12.953147
Proc. SPIE 1088, New Stepper For Large-Area Lithography, 0000 (25 July 1989); doi: 10.1117/12.953148
Proc. SPIE 1088, A Simple And Calibratable Method For The Determination Of Optimal Focus, 0000 (25 July 1989); doi: 10.1117/12.953149
Proc. SPIE 1088, Effect of Alignment Marks Design and Processing Factors on Overlay Accuracy, 0000 (25 July 1989); doi: 10.1117/12.953150
Proc. SPIE 1088, Laser Alignment Signal Simulation for Analysis of Al Layers, 0000 (25 July 1989); doi: 10.1117/12.953151
Proc. SPIE 1088, A Production Proven Technique For Machine-To-Machine Overlay Matching, 0000 (25 July 1989); doi: 10.1117/12.953152
Proc. SPIE 1088, Moire Alignment Technique For Projection Photolithographic System, 0000 (25 July 1989); doi: 10.1117/12.953153
Proc. SPIE 1088, Linear/Angular Displacement Interferometer For Wafer Stage Metrology, 0000 (25 July 1989); doi: 10.1117/12.953154
Proc. SPIE 1088, Improving Photolithographic Tool Utilization Through An Advanced System Interface, 0000 (25 July 1989); doi: 10.1117/12.953155
Proc. SPIE 1088, Automatic Creation of Stepper Job Files, 0000 (25 July 1989); doi: 10.1117/12.953156
Proc. SPIE 1088, Expert System for ASIC Imaging, 0000 (25 July 1989); doi: 10.1117/12.953157
Proc. SPIE 1088, Diffraction Limited Imaging Using Incoherently Illuminated Holographic Masks, 0000 (25 July 1989); doi: 10.1117/12.953158
Proc. SPIE 1088, Understanding Focus Effects In Submicron Optical Lithography, Part 2: Photoresist Effects, 0000 (25 July 1989); doi: 10.1117/12.953159
Proc. SPIE 1088, Optimization and Characterization of Single Layer Resist Techniques for 1 Am CMOS Production, 0000 (25 July 1989); doi: 10.1117/12.953160
Proc. SPIE 1088, Characterization Of Submicron Optical Lithography For CMOS Polysilicon Gate Electrodes, 0000 (25 July 1989); doi: 10.1117/12.953161
Proc. SPIE 1088, In-House Characterization Technique For Steppers, 0000 (25 July 1989); doi: 10.1117/12.953162
Proc. SPIE 1088, Improvement Of The Transfer-Efficiency Of A Junction CCD By Modifying The Diffusion-Mask Configuration, 0000 (25 July 1989); doi: 10.1117/12.953163
Proc. SPIE 1088, Microstructure Fabrication with Implanted Etch Barriers, 0000 (25 July 1989); doi: 10.1117/12.953164
Proc. SPIE 1088, ANKAN : Simulator for Resist Exposure and Etching, 0000 (25 July 1989); doi: 10.1117/12.953165
Proc. SPIE 1088, An Analytical Model For The Aerial Image Simulation Of 2-D Mask Structures. Optimization Of The ODB Tapering Method, 0000 (25 July 1989); doi: 10.1117/12.953166
Proc. SPIE 1088, Modeling Of Optical Alignment Images For Semiconductor Structures, 0000 (25 July 1989); doi: 10.1117/12.953167
Proc. SPIE 1088, Advanced Lithography Excimer System: Absolute Wavelength Adjustment, Five Watt Average Power, 0000 (25 July 1989); doi: 10.1117/12.953168
Proc. SPIE 1088, Krypton Fluoride Excimer Laser for Microlithography, 0000 (25 July 1989); doi: 10.1117/12.953169
Proc. SPIE 1088, Performance Characteristics Of A Narrow Band Industrial Excimer Laser, 0000 (25 July 1989); doi: 10.1117/12.953170
Proc. SPIE 1088, Step And Scan: A Systems Overview Of A New Lithography Tool, 0000 (25 July 1989); doi: 10.1117/12.953171
Proc. SPIE 1088, Excimer Laser Stepper for Sub-half Micron Lithography, 0000 (25 July 1989); doi: 10.1117/12.953172
Proc. SPIE 1088, Broadband Deep-UV High NA Photolithography System, 0000 (25 July 1989); doi: 10.1117/12.953173
Proc. SPIE 1088, Effects of Line Narrowing and Collimation on Excimer Radiation at 248nm, 0000 (25 July 1989); doi: 10.1117/12.953174
Proc. SPIE 1088, Image Reversal Process Using PR1024MB Photo Resist By KrF Excimer Laser Lithography, 0000 (25 July 1989); doi: 10.1117/12.953175
Proc. SPIE 1088, Deep-UV Photolithography With a Small-Field 0.6 N.A. 'Microstepper', 0000 (25 July 1989); doi: 10.1117/12.953176
Proc. SPIE 1088, Sub-Half Micron Lithography with Excimer Laser, 0000 (25 July 1989); doi: 10.1117/12.953177
Proc. SPIE 1088, 0.25 m Periodic Structures For Lightwave Technology Fabricated By Spatial Frequency Doubling Lithography (SFDL), 0000 (25 July 1989); doi: 10.1117/12.953178
Proc. SPIE 1088, Photolithography For Integrated Thin Film Read/Write Heads, 0000 (25 July 1989); doi: 10.1117/12.953179
Proc. SPIE 1088, Lithographic Replication Of Compact Disk Structures, 0000 (25 July 1989); doi: 10.1117/12.953180
Proc. SPIE 1088, Use Of Mask Making Technology In Producing High Quality, Low Cost Passive Optical Devices, 0000 (25 July 1989); doi: 10.1117/12.953181
Proc. SPIE 1088, An Experimental Determination of the Optical Lithographic Requirements for Sub-Micron Projection Printing, 0000 (25 July 1989); doi: 10.1117/12.953182
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