PROCEEDINGS VOLUME 1138
1989 INTERNATIONAL CONGRESS ON OPTICAL SCIENCE AND ENGINEERING | 24-28 APRIL 1989
Optical Microlithography and Metrology for Microcircuit Fabrication
IN THIS VOLUME

0 Sessions, 25 Papers, 0 Presentations
All Papers  (25)
1989 INTERNATIONAL CONGRESS ON OPTICAL SCIENCE AND ENGINEERING
24-28 April 1989
Paris, France
All Papers
Proc. SPIE 1138, New Developments In Wafer Stepper Technology For Submicron Devices, 0000 (11 October 1989); doi: 10.1117/12.961740
Proc. SPIE 1138, Customized Exposure Bandwidth For I-Line Resist Systems, 0000 (11 October 1989); doi: 10.1117/12.961741
Proc. SPIE 1138, Optimized Resist Process For High Na G-Line Lenses, 0000 (11 October 1989); doi: 10.1117/12.961742
Proc. SPIE 1138, A New Fabrication Process For Compact Disk, 0000 (11 October 1989); doi: 10.1117/12.961743
Proc. SPIE 1138, Grating Moire Effects With Partially Coherent Illumination And Detection, 0000 (11 October 1989); doi: 10.1117/12.961744
Proc. SPIE 1138, Parameters Affecting Alignment Dispersion On An Optical Wafer Stepper, 0000 (11 October 1989); doi: 10.1117/12.961745
Proc. SPIE 1138, A Production Proven Technique For Machine-To-Machine Overlay Matching, 0000 (11 October 1989); doi: 10.1117/12.961746
Proc. SPIE 1138, Overlay Results Comparison Between Two Approaches When Mixing Optical Steppers With Scanner, 0000 (11 October 1989); doi: 10.1117/12.961747
Proc. SPIE 1138, Focus Effects In Submicron Optical Lithography, Optical And Photoresist Effects, 0000 (11 October 1989); doi: 10.1117/12.961748
Proc. SPIE 1138, A Negative Aqueous Developable Electron-Beam Resist Under Deep UV Exposure, 0000 (11 October 1989); doi: 10.1117/12.961749
Proc. SPIE 1138, Five Watt Industrial Lithography Excimer Laser System, 0000 (11 October 1989); doi: 10.1117/12.961750
Proc. SPIE 1138, Excimer Lasers For Lithography Applications, 0000 (11 October 1989); doi: 10.1117/12.961751
Proc. SPIE 1138, Concept Of Buried Mask And Its Realisation, 0000 (11 October 1989); doi: 10.1117/12.961752
Proc. SPIE 1138, Design Principles For An Illumination System Using An Excimer Laser As A Light Source, 0000 (11 October 1989); doi: 10.1117/12.961753
Proc. SPIE 1138, Illumination System Of An Excimer Laser Stepper, 0000 (11 October 1989); doi: 10.1117/12.961754
Proc. SPIE 1138, Optical Modeling Of Line Object In Microelectronics Using Radiometric Approach, 0000 (11 October 1989); doi: 10.1117/12.961755
Proc. SPIE 1138, Ultra-Precise Mask Metrology - Development And Practical Results Of A New Measuring Machine, 0000 (11 October 1989); doi: 10.1117/12.961756
Proc. SPIE 1138, Single Level Registration Metrology And Overlay Measurements On Production Wafers, 0000 (11 October 1989); doi: 10.1117/12.961757
Proc. SPIE 1138, Microscope Objectives For Semiconductor Technology, 0000 (11 October 1989); doi: 10.1117/12.961758
Proc. SPIE 1138, An Automated System For Submicrometer Defect Detection On Patterned Wafers, 0000 (11 October 1989); doi: 10.1117/12.961759
Proc. SPIE 1138, A Laser Heterodyne Interferometer For Measuring Surface Roughness, 0000 (11 October 1989); doi: 10.1117/12.961760
Proc. SPIE 1138, Principles And Conception Of LCVD Reactors For Photolytic And Pyrolytic Applications In Microelectronics, 0000 (11 October 1989); doi: 10.1117/12.961761
Proc. SPIE 1138, Laser Microchemistry : A Powerful Tool For VLSI, 0000 (11 October 1989); doi: 10.1117/12.961762
Proc. SPIE 1138, Laser Programmable Vias For Reconfiguration Of Integrated Circuits, 0000 (11 October 1989); doi: 10.1117/12.961763
Proc. SPIE 1138, Pulsed U.V. Laser Cleaning Of GaSb Single Crystal Surface In Ultra-High-Vacuum, 0000 (11 October 1989); doi: 10.1117/12.961764
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