PROCEEDINGS VOLUME 12325
PHOTOMASK JAPAN 2022 | 26-28 APRIL 2022
Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology
Editor(s): Yosuke Kojima
Editor Affiliations +
Proceedings Volume 12325 is from: Logo
PHOTOMASK JAPAN 2022
26-28 April 2022
Online Only, Japan
Front Matter: Volume 12325
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1232501 (2022) https://doi.org/10.1117/12.2652635
EUV from U.S.
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1232502 (2022) https://doi.org/10.1117/12.2651194
NIL I
T. Nakasugi
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1232503 (2022) https://doi.org/10.1117/12.2640653
Kenichi Kobayashi, Hirotoshi Torii, Mitsuru Hiura, Yukio Takabayashi, Atsushi Kimura, Yoshio Suzaki, Toshiki Ito, Kiyohito Yamamoto, Jin Choi, et al.
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1232504 (2022) https://doi.org/10.1117/12.2640651
EUV for High NA
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1232505 https://doi.org/10.1117/12.2640511
EUV Technologies
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1232506 (2022) https://doi.org/10.1117/12.2640532
Opening Session Day 2: EDA
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1232507 (2022) https://doi.org/10.1117/12.2641214
Curvilinear Data Handling
Jin Choi, Soo Ryu, Sukho Lee, Minah Kim, Sanghee Lee, Peter Buck, Bhardwaj Durvasula, Sayalee Gharat, Vlad Liubich
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1232508 (2022) https://doi.org/10.1117/12.2641557
John Valadez, Yu-Po Tang, Mikhayil Mkrtchyan
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1232509 (2022) https://doi.org/10.1117/12.2640638
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250A (2022) https://doi.org/10.1117/12.2642161
Defect Control and Resolution
Masaya Kamiya, Kensuke Demura, Minami Nakamura, Kei Hattori
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250B (2022) https://doi.org/10.1117/12.2640652
Joyce Wang, Ansel Huang, Mazer Li, Josh Cheng, Bin Lin, Ewin Zhuo, Gerrard Chen, Kevin Yu, Yu-Kuang Huang, et al.
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250C (2022) https://doi.org/10.1117/12.2640450
Naoto Yonemaru, Kazuaki Matsui, Itaru Yoshida, Yosuke Kojima, Mitsuharu Yamana
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250D (2022) https://doi.org/10.1117/12.2640377
EUV Tools
P. Y. Portnichenko, F. Oezdogan, L. Dawahre, O. Lohse, B. Kalsbeck, P. Jain, H. Steigerwald, S. Ismail, F. Laske
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250E (2022) https://doi.org/10.1117/12.2642100
Opening Session Day 3: EUV and Industry Trends
Katrina Rook, JoJo Daof, Antonio Checco, Mohammad Saghayezhian, Kenji Yamamoto, Meng H. Lee, Marjorie Chee
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250F (2022) https://doi.org/10.1117/12.2642182
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250G (2022) https://doi.org/10.1117/12.2640370
Inspection and Metrology
Tsunehito Kohyama, Hiroki Miyai, Toshiyuki Todoroki
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250H (2022) https://doi.org/10.1117/12.2642098
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250I (2022) https://doi.org/10.1117/12.2642210
Shinichi Nakazawa, Yosuke Okamoto, Kotaro Maruyama, Yuichiro Yamazaki, Gong-Hwan Kim, Domingo Choi
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250J (2022) https://doi.org/10.1117/12.2640526
Flat Panel Display
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250K (2022) https://doi.org/10.1117/12.2642097
Metrology and MPC
Maxence Delorme, Werner Gillijns, Christoph Hennerkes, Emily Gallagher, Adam Lyons, Mahmoud Mohsen, Tom Wallow
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250L (2022) https://doi.org/10.1117/12.2642867
M. Mucientes, A. Khachaturiants, R. Trussell, A. Kalinin, Y. Guo, E. C. Simons, S. Kim, O. Nadyarnykh, A. Moussa, et al.
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250M (2022) https://doi.org/10.1117/12.2641698
Nezih Unal, John Duff, Michael Krueger, Ulrich Hofmann, Dmitri Titko
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250N (2022) https://doi.org/10.1117/12.2640513
Writing Tools
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250O (2022) https://doi.org/10.1117/12.2641338
Markus Greul, Holger Sailer, Matthias Wahl, John Duff, Jeff Michelmann, Richard Bojko, Dmitri Titko, Konrad Rössler, Nezih Ünal
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250P (2022) https://doi.org/10.1117/12.2640799
Poster Session
PengZhi Wei, YanQiu Li, ZhaoXuan Li, Zhen Li, YiYu Sun
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250Q (2022) https://doi.org/10.1117/12.2640681
Ching-Te Kuo, Kuo-Kai Hung, Chia-Ho Chuang, Bill Chiu
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250R (2022) https://doi.org/10.1117/12.2640518
Herman Boerland, Anush Hovhannisyan, Mikhayil Mkrtchyan, Hari Konnanur, Mitsuya Toda, Mirai Anazawa
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250S (2022) https://doi.org/10.1117/12.2640587
Hsiang Jen Yang, Po Sheng Wang, Chun Chieh Han, Yi Min Lin, Wen Wei Lee, Wei Shen Chen
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250T (2022) https://doi.org/10.1117/12.2640527
Fei-Lin Liu, Po-Hsiang Yang, Liang-Chieh Lin, Po-Sheng Wang
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250U (2022) https://doi.org/10.1117/12.2640662
Sukho Lee, Raewon Yi, Jihyeon Choi, Eok Bong Kim, Jin Choi, Sanghee Lee
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250V (2022) https://doi.org/10.1117/12.2642025
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