PROCEEDINGS VOLUME 1263
MICROLITHOGRAPHY '90 | 4-8 MARCH 1990
Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX
MICROLITHOGRAPHY '90
4-8 March 1990
San Jose, CA, United States
Ion-Beam Lithography
Proc. SPIE 1263, Model for focused ion beam deposition, 0000 (1 May 1990); doi: 10.1117/12.20140
Proc. SPIE 1263, Microstructuring of gold on x-ray masks with focused Ga+ ion beams, 0000 (1 May 1990); doi: 10.1117/12.20141
Proc. SPIE 1263, Focused ion-beam-induced tungsten deposition for repair of clear defects on x-ray masks, 0000 (1 May 1990); doi: 10.1117/12.20142
Proc. SPIE 1263, Advances in mask fabrication and alignment for masked ion-beam lithography, 0000 (1 May 1990); doi: 10.1117/12.20143
Proc. SPIE 1263, Focused ion-beam modification and patterning of high-Tc superconductors, 0000 (1 May 1990); doi: 10.1117/12.20144
Proc. SPIE 1263, Gate oxide breakdown by focused ion-beam irradiation, 0000 (1 May 1990); doi: 10.1117/12.20145
Proc. SPIE 1263, KeV ion-beam-exposed PMIPK and PPIPK, 0000 (1 May 1990); doi: 10.1117/12.20146
X-Ray Lithography I
Proc. SPIE 1263, Comparison of projection and proximity printings--from UV to x ray, 0000 (1 May 1990); doi: 10.1117/12.20147
Electron-Beam and X-Ray Resist Technology
Proc. SPIE 1263, Soft x-ray resist characterization: studies with a laser plasma x-ray source, 0000 (1 May 1990); doi: 10.1117/12.20148
X-Ray Lithography I
Proc. SPIE 1263, Defect printability for soft x-ray microlithography, 0000 (1 May 1990); doi: 10.1117/12.20149
Proc. SPIE 1263, Target x-ray source lithography and photolithography mixed and match system, 0000 (1 May 1990); doi: 10.1117/12.20150
Proc. SPIE 1263, Electron storage rings as x-ray lithography sources: an overview, 0000 (1 May 1990); doi: 10.1117/12.20151
Proc. SPIE 1263, Helios: a compact superconducting x-ray source for production lithography, 0000 (1 May 1990); doi: 10.1117/12.20152
Proc. SPIE 1263, ALF: a facility for x-ray lithography, 0000 (1 May 1990); doi: 10.1117/12.20153
Proc. SPIE 1263, Optimizing a synchrotron based x-ray lithography system for IC manufacturing, 0000 (1 May 1990); doi: 10.1117/12.20154
Electron-Beam Lithography
Proc. SPIE 1263, Electron-beam lithography: directions in direct write and mask making, 0000 (1 May 1990); doi: 10.1117/12.20155
Proc. SPIE 1263, Chip cluster registration technique for increased throughput in e-beam direct writing, 0000 (1 May 1990); doi: 10.1117/12.20156
Proc. SPIE 1263, Neural network approach to proximity effect corrections in electron-beam lithography, 0000 (1 May 1990); doi: 10.1117/12.20157
Proc. SPIE 1263, Charge-up prevention process for e-beam direct writing with multilayer resist, 0000 (1 May 1990); doi: 10.1117/12.20159
Proc. SPIE 1263, Vacuum passivated T-gates: a new method for fabricating submicron gates, 0000 (1 May 1990); doi: 10.1117/12.20160
Proc. SPIE 1263, E-beam direct write of rectangular and mushroom gates for GaAs FETs, 0000 (1 May 1990); doi: 10.1117/12.20161
X-Ray Lithography II
Proc. SPIE 1263, Modeling of thermal stresses and distortions in x-ray masks employing the embedded absorber structure, 0000 (1 May 1990); doi: 10.1117/12.20162
Proc. SPIE 1263, 75-mm diameter diamond x-ray membrane, 0000 (1 May 1990); doi: 10.1117/12.20163
Proc. SPIE 1263, Control of optical and mechanical properties of polycrystalline silicon membranes for x-ray masks, 0000 (1 May 1990); doi: 10.1117/12.20164
Proc. SPIE 1263, X-ray absorbing and mechanical properties of Au-C film for x-ray mask absorber, 0000 (1 May 1990); doi: 10.1117/12.20165
Additional Paper
Proc. SPIE 1263, Advanced chemically amplified resist, 0000 (1 May 1990); doi: 10.1117/12.20166
Electron-Beam Lithography
Proc. SPIE 1263, Modified maleic anhydride copolymers as e-beam resists, 0000 (1 May 1990); doi: 10.1117/12.20167
Electron-Beam and X-Ray Resist Technology
Proc. SPIE 1263, PRIME process: an alternative to multiple layer resist systems and high accelerating voltage for e-beam lithography, 0000 (1 May 1990); doi: 10.1117/12.20168
Proc. SPIE 1263, System-9: a new positive tone novalac-based high-resolution electron-beam resist, 0000 (1 May 1990); doi: 10.1117/12.20169
Poster Session: Beam Lithography
Proc. SPIE 1263, Projection moire alignment technique for mix and match lithographic system, 0000 (1 May 1990); doi: 10.1117/12.20170
Proc. SPIE 1263, Metrology for gold absorber/silicon membrane x-ray reticles, 0000 (1 May 1990); doi: 10.1117/12.20171
Proc. SPIE 1263, Development of radiation-cooled slotted rotating target x-ray source (III), 0000 (1 May 1990); doi: 10.1117/12.20172
X-Ray Lithography I
Ion-Beam Lithography
Proc. SPIE 1263, Focused ion-beam-assisted deposition of tungsten, 0000 (1 May 1990); doi: 10.1117/12.20174
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