PROCEEDINGS VOLUME 1496
10TH ANNUAL SYMPOSIUM ON MICROLITHOGRAPHY | 26-27 SEPTEMBER 1990
10th Annual Symp on Microlithography
IN THIS VOLUME

0 Sessions, 22 Papers, 0 Presentations
Keynote  (1)
Metrology  (3)
10TH ANNUAL SYMPOSIUM ON MICROLITHOGRAPHY
26-27 September 1990
Sunnyvale, CA, United States
Keynote
Proc. SPIE 1496, Competitiveness, 0000 (1 March 1991); doi: 10.1117/12.29739
Phase Shift Masks
Proc. SPIE 1496, What IS a phase-shifting mask?, 0000 (1 March 1991); doi: 10.1117/12.29740
E-Beam/Laser Lithography
Proc. SPIE 1496, Photomask fabrication utilizing a Philips/Cambridge vector scan e-beam system, 0000 (1 March 1991); doi: 10.1117/12.46754
Proc. SPIE 1496, E-beam data compaction method for large-capacity mask ROM production, 0000 (1 March 1991); doi: 10.1117/12.46755
Proc. SPIE 1496, Performance appraisal of the ATEQ CORE-2500 in production, 0000 (1 March 1991); doi: 10.1117/12.29743
Proc. SPIE 1496, Proximity effect correction on MEBES for 1x mask fabrication: lithography issues and tradeoffs at 0.25 micron, 0000 (1 March 1991); doi: 10.1117/12.29744
Proc. SPIE 1496, 5X reticle fabrication using MEBES multiphase virtual address and AZ5206 resist, 0000 (1 March 1991); doi: 10.1117/12.46756
Advanced Mask Technology
Proc. SPIE 1496, Continuous flow manufacturing, 0000 (1 March 1991); doi: 10.1117/12.29746
Proc. SPIE 1496, Sophisticated masks, 0000 (1 March 1991); doi: 10.1117/12.29747
E-Beam/Laser Lithography
Proc. SPIE 1496, EBES4: mask/reticle writer for the 90's, 0000 (1 March 1991); doi: 10.1117/12.29748
Proc. SPIE 1496, Metamorphosis of laser writer, 0000 (1 March 1991); doi: 10.1117/12.29749
Phase Shift Masks
Proc. SPIE 1496, Chromeless phase-shifted masks: a new approach to phase-shifting masks, 0000 (1 March 1991); doi: 10.1117/12.29750
Proc. SPIE 1496, Phase-shifting and other challenges in optical mask technology, 0000 (1 March 1991); doi: 10.1117/12.29751
Proc. SPIE 1496, Modeling phase-shifting masks, 0000 (1 March 1991); doi: 10.1117/12.46757
Metrology
Proc. SPIE 1496, Capability assessment and comparison of the Nikon 2i, Nikon 3i, and IMS-2000 registration measurement devices, 0000 (1 March 1991); doi: 10.1117/12.46758
Proc. SPIE 1496, Improving submicron CD measurements through optimum operating points, 0000 (1 March 1991); doi: 10.1117/12.29754
Proc. SPIE 1496, Application of a reduced area electrical test pattern to precise pattern registration measurements, 0000 (1 March 1991); doi: 10.1117/12.29755
Advanced Mask Technology
Proc. SPIE 1496, Issues in the repair of x-ray masks, 0000 (1 March 1991); doi: 10.1117/12.29756
Proc. SPIE 1496, Evaluation of a high-resolution negative-acting electron-beam resist GMC for photomask manufacturing, 0000 (1 March 1991); doi: 10.1117/12.46759
Proc. SPIE 1496, Improvements in sensitivity and discrimination capability of the PD reticle/mask inspection system, 0000 (1 March 1991); doi: 10.1117/12.29758
Proc. SPIE 1496, Pelliclizing technology, 0000 (1 March 1991); doi: 10.1117/12.29759
E-Beam/Laser Lithography
Proc. SPIE 1496, Hitachi e-beam lithography tools for advanced applications, 0000 (1 March 1991); doi: 10.1117/12.29760
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