PROCEEDINGS VOLUME 1503
ECO4 (THE HAGUE '91) | 11-15 MARCH 1991
Excimer Lasers and Applications III
ECO4 (THE HAGUE '91)
11-15 March 1991
The Hague, Netherlands
High-Power Systems
Proc. SPIE 1503, Recent progress towards multikilowatt output, 0000 (1 September 1991); doi: 10.1117/12.46913
Proc. SPIE 1503, Design considerations for high-power industrial excimer lasers, 0000 (1 September 1991); doi: 10.1117/12.46914
Proc. SPIE 1503, Review of the multikilohertz performance of the CHIRP laser and components, 0000 (1 September 1991); doi: 10.1117/12.46915
Proc. SPIE 1503, Parametric study of small-volume long-pulse x-ray preionized XeCl laser with double-discharge and fast magnetic switch, 0000 (1 September 1991); doi: 10.1117/12.46916
Simulation Codes and Special Devices
Proc. SPIE 1503, Excimer laser development at the ENEA Frascati Centre: discharge instabilities study, 0000 (1 September 1991); doi: 10.1117/12.46917
Proc. SPIE 1503, Modeling of a long-pulse high-efficiency XeCl laser with double-discharge and fast magnetic switch, 0000 (1 September 1991); doi: 10.1117/12.46918
Proc. SPIE 1503, Theoretical and experimental investigations on pressure-wave reflections and attenuation in high-power excimer lasers, 0000 (1 September 1991); doi: 10.1117/12.46919
Proc. SPIE 1503, Super small excimer laser, 0000 (1 September 1991); doi: 10.1117/12.46920
Proc. SPIE 1503, Experimental studies of an XeCl laser with UV preionization perpendicular and parallel to the electrode surfaces, 0000 (1 September 1991); doi: 10.1117/12.46921
Proc. SPIE 1503, Importance of nonequilibrium vibrational kinetics of HCl in XeCl laser modeling, 0000 (1 September 1991); doi: 10.1117/12.46922
Source Special Components
Proc. SPIE 1503, Excimer laser with sealed x-ray preionizer, 0000 (1 September 1991); doi: 10.1117/12.46923
RF Plumping and Beam Control Techniques
Proc. SPIE 1503, Excitation of an excimer laser with microwave resonator, 0000 (1 September 1991); doi: 10.1117/12.46924
Proc. SPIE 1503, Excimer laser performance under various microwave excitation conditions, 0000 (1 September 1991); doi: 10.1117/12.46925
Proc. SPIE 1503, Low-loss line-narrowed excimer oscillator for projection photolithography: experiments and simulation, 0000 (1 September 1991); doi: 10.1117/12.46926
Proc. SPIE 1503, Pulse compression of KrF laser radiation by stimulated scattering, 0000 (1 September 1991); doi: 10.1117/12.46927
Source Special Components
Proc. SPIE 1503, Evolution of an excimer laser gas mix, 0000 (1 September 1991); doi: 10.1117/12.46928
Proc. SPIE 1503, High-repetition-rate pseudospark switches for pulsed high-power lasers, 0000 (1 September 1991); doi: 10.1117/12.46929
Proc. SPIE 1503, Damage testing of optical components for high-power excimer lasers, 0000 (1 September 1991); doi: 10.1117/12.46930
Proc. SPIE 1503, Electrical discharges investigation in gas-pulsed laser, 0000 (1 September 1991); doi: 10.1117/12.46931
Polymers
Proc. SPIE 1503, Controlled structuring of polymer surfaces by UV laser irradiation, 0000 (1 September 1991); doi: 10.1117/12.46932
Proc. SPIE 1503, Excimer laser patterning of flexible materials, 0000 (1 September 1991); doi: 10.1117/12.46933
Proc. SPIE 1503, Influencing adherence properties of polymers by excimer laser radiation, 0000 (1 September 1991); doi: 10.1117/12.46934
Proc. SPIE 1503, Effective temperatures of polymer laser ablation, 0000 (1 September 1991); doi: 10.1117/12.46935
Ceramics
Proc. SPIE 1503, Excimer laser processing of ceramics and fiber-reinforced polymers assisted by a diagnostic system, 0000 (1 September 1991); doi: 10.1117/12.46936
Proc. SPIE 1503, Excimer laser surface treatment of ceramics, 0000 (1 September 1991); doi: 10.1117/12.46937
Proc. SPIE 1503, Surface nitride synthesis by multipulse excimer laser irradiation, 0000 (1 September 1991); doi: 10.1117/12.46938
Proc. SPIE 1503, Light-induced polishing of evaporating surface, 0000 (1 September 1991); doi: 10.1117/12.46939
Oxides and Metals
Proc. SPIE 1503, In-situ growth of Y1Ba2Cu3O7-x thin films using XeCl excimer and Nd:YAG lasers, 0000 (1 September 1991); doi: 10.1117/12.46940
Proc. SPIE 1503, Ablation of ITO and TO films from glass substrates, 0000 (1 September 1991); doi: 10.1117/12.46941
Proc. SPIE 1503, Investigations on excimer-laser-treated Cu/Cr contact materials, 0000 (1 September 1991); doi: 10.1117/12.46942
Chemical Vapor Deposition
Proc. SPIE 1503, Excimer laser deposition and characterization of tin and tin-oxide films, 0000 (1 September 1991); doi: 10.1117/12.46943
Proc. SPIE 1503, Laser chemistry of dimethylcadmium adsorbed on silicon: 308- versus 222-nm laser excitation, 0000 (1 September 1991); doi: 10.1117/12.46944
Proc. SPIE 1503, Photochemical changes of rare-earth valent state in gamma-irradiated CaF2:Pr crystals by the excimer laser radiation: investigation and application, 0000 (1 September 1991); doi: 10.1117/12.46945
Medical Applications and Diagnosis
Proc. SPIE 1503, Use of excimer lasers in medicine: applications, problems, and dangers, 0000 (1 September 1991); doi: 10.1117/12.46946
Proc. SPIE 1503, Bundle of tapered fibers for the transmission of high-power excimer laser pulses, 0000 (1 September 1991); doi: 10.1117/12.46947
Proc. SPIE 1503, Spectral and time-resolved measurements of pollutants on water surface by an XeCl laser fluorosensor, 0000 (1 September 1991); doi: 10.1117/12.46948
Proc. SPIE 1503, Excimer laser cutting of corneal transplants, 0000 (1 September 1991); doi: 10.1117/12.46949
Laser Plasma X-Ray Sources
Proc. SPIE 1503, Laser plasma XUV sources: a role for excimer lasers?, 0000 (1 September 1991); doi: 10.1117/12.46950
Proc. SPIE 1503, 100-Hz KrF laser plasma x-ray source, 0000 (1 September 1991); doi: 10.1117/12.46951
Proc. SPIE 1503, Applications of laser plasmas in XUV photoabsorption spectroscopy, 0000 (1 September 1991); doi: 10.1117/12.46952
Proc. SPIE 1503, Laser-produced continua for studies in the XUV, 0000 (1 September 1991); doi: 10.1117/12.46953
General Poster Session
Proc. SPIE 1503, Efficient population of low-vibrational-number electronic states of excimer molecules: the argon dimer, 0000 (1 September 1991); doi: 10.1117/12.46954
Proc. SPIE 1503, Atomic xenon recombination laser excited by thermal ionizing radiation from a magnetoplasma compressor and discharge, 0000 (1 September 1991); doi: 10.1117/12.46955
Proc. SPIE 1503, Excimer laser processing of diamond-like films, 0000 (1 September 1991); doi: 10.1117/12.46956
Proc. SPIE 1503, Time-resolved x-ray absorption spectroscopy apparatus using laser plasma as an x-ray source, 0000 (1 September 1991); doi: 10.1117/12.46957
Proc. SPIE 1503, Excimer-dye laser system for diagnosis and therapy of cancer, 0000 (1 September 1991); doi: 10.1117/12.46958
Proc. SPIE 1503, L-shell x-ray spectroscopy of laser-produced plasmas in the 1-keV region, 0000 (1 September 1991); doi: 10.1117/12.46959
High-Power Systems
Proc. SPIE 1503, Parametric study of a high-average-power XeCl laser, 0000 (1 September 1991); doi: 10.1117/12.46960
Proc. SPIE 1503, Kilowatt-range high-repetition-rate excimer lasers, 0000 (1 September 1991); doi: 10.1117/12.46961
General Poster Session
Proc. SPIE 1503, Multistage XeCl excimer system "Cactus" and some investigations of stimulated scattering in liquids, 0000 (1 September 1991); doi: 10.1117/12.46962
Proc. SPIE 1503, Photodestruction of organic compounds exposed to pulsed VUV irradiation, 0000 (1 September 1991); doi: 10.1117/12.46963
Chemical Vapor Deposition
Proc. SPIE 1503, Laser-assisted deposition of thin films onto transparent substrates from liquid-phase organometallic precursor: iron acetylacetonate, 0000 (1 September 1991); doi: 10.1117/12.46964
Plenary Session
Proc. SPIE 1503, Free-electron lasers as light sources for basic research, 0000 (1 September 1991); doi: 10.1117/12.46965
Proc. SPIE 1503, Motivation for DOC III: 64-bit digital optical computer, 0000 (1 September 1991); doi: 10.1117/12.46966
Back to Top