PROCEEDINGS VOLUME 1519
INTERNATIONAL CONFERENCE ON THIN FILM PHYSICS AND APPLICATIONS | 15-17 APRIL 1991
International Conference on Thin Film Physics and Applications
INTERNATIONAL CONFERENCE ON THIN FILM PHYSICS AND APPLICATIONS
15-17 April 1991
Shanghai, China
Film Formation and Analysis
Proc. SPIE 1519, Large-scale production of a broadband antireflection coating on ophthalmic lenses with ion-assisted deposition, 0000 (1 November 1991); doi: 10.1117/12.47178
Organic and Polymer Films
Proc. SPIE 1519, Study of PEO on LTI carbon surfaces by ellipsometry and tribometry, 0000 (1 November 1991); doi: 10.1117/12.47179
Infrared and Optoelectronic Films
Proc. SPIE 1519, Photosensitivity of selenium-bismuth films with varigap structure, 0000 (1 November 1991); doi: 10.1117/12.47180
Semiconducting Films
Proc. SPIE 1519, Condensation mechanisms and properties of rf-sputtered a-Si:H, 0000 (1 November 1991); doi: 10.1117/12.47181
Film Formation and Analysis
Proc. SPIE 1519, Studies of correlation of molecular structure under preparation conditions for noncrystalline selenium thin films with aid of computer simulation, 0000 (1 November 1991); doi: 10.1117/12.47188
Optical Films
Proc. SPIE 1519, Materials for optimal multilayer coating, 0000 (1 November 1991); doi: 10.1117/12.47208
Organic and Polymer Films
Proc. SPIE 1519, Optical transition characteristic energies of amorphous and polycrystalline tin oxide films, 0000 (1 November 1991); doi: 10.1117/12.47241
Film Formation and Analysis
Proc. SPIE 1519, New ion-beam sources and their applications to thin film physics, 0000 (1 November 1991); doi: 10.1117/12.47248
Semiconducting Films
Proc. SPIE 1519, Study on the high-field current transport mechanisms in thin SiOxNy films, 0000 (1 November 1991); doi: 10.1117/12.47257
Proc. SPIE 1519, High-field electron trapping and detrapping characteristics in thin SiOxNy films, 0000 (1 November 1991); doi: 10.1117/12.47267
Film Formation and Analysis
Proc. SPIE 1519, Sputtering of silicate glasses, 0000 (1 November 1991); doi: 10.1117/12.47272
Infrared and Optoelectronic Films
Proc. SPIE 1519, Depopulation kinetics of electron traps in thin oxynitride films, 0000 (1 November 1991); doi: 10.1117/12.47286
Film Formation and Analysis
Proc. SPIE 1519, Multicomponent electric-arc source of metallic plasma, 0000 (1 November 1991); doi: 10.1117/12.47293
Superlattice Films
Proc. SPIE 1519, Application of AlGaAs/GaAs superlattice for negative-differential-resistance transistor, 0000 (1 November 1991); doi: 10.1117/12.47294
Proc. SPIE 1519, Applications of GaAs grade-period doping superlattice for negative-differential-resistance device, 0000 (1 November 1991); doi: 10.1117/12.47295
Film Formation and Analysis
Proc. SPIE 1519, Formation of Si02 film on plastic substrate by liquid-phase-deposition method, 0000 (1 November 1991); doi: 10.1117/12.47296
Infrared and Optoelectronic Films
Proc. SPIE 1519, Sensitivity and selectivity enhancement in semiconductor gas sensors, 0000 (1 November 1991); doi: 10.1117/12.47297
Film Formation and Analysis
Proc. SPIE 1519, Preparation of tin oxide and insulating oxide thin films for multilayered gas sensors, 0000 (1 November 1991); doi: 10.1117/12.47298
Proc. SPIE 1519, GaN single-crystal films on silicon substrates grown by MOVPE, 0000 (1 November 1991); doi: 10.1117/12.47299
Surface and Interface
Proc. SPIE 1519, Basis and applicaton of evanescent fluorescence measurement, 0000 (1 November 1991); doi: 10.1117/12.47300
Film Formation and Analysis
Proc. SPIE 1519, Thin film fabrication of stabilized zirconia for solid oxide fuel cells, 0000 (1 November 1991); doi: 10.1117/12.47301
Semiconducting Films
Proc. SPIE 1519, Recent progress in Si thin film technology for solar cells, 0000 (1 November 1991); doi: 10.1117/12.47302
Film Formation and Analysis
Proc. SPIE 1519, Optical properties of some ion-assisted deposited oxides, 0000 (1 November 1991); doi: 10.1117/12.47303
Proc. SPIE 1519, Structural investigations of the (Si1-x,Gex)O2 single-crystal thin films by x-ray photoelectron spectroscopy, 0000 (1 November 1991); doi: 10.1117/12.47304
Proc. SPIE 1519, Growth of PbTiO3 films by photo-MOCVD, 0000 (1 November 1991); doi: 10.1117/12.47305
Surface and Interface
Proc. SPIE 1519, Interface stress at thin film semiconductor heterostructures, 0000 (1 November 1991); doi: 10.1117/12.47306
Semiconducting Films
Proc. SPIE 1519, Deposition of a-Si:H using a supersonically expanding argon plasma, 0000 (1 November 1991); doi: 10.1117/12.47307
Surface and Interface
Proc. SPIE 1519, Finite element study on indentations into TiN- and multiple TiN/Ti- layers on steel, 0000 (1 November 1991); doi: 10.1117/12.47308
Organic and Polymer Films
Proc. SPIE 1519, Ion implantation of polymers for electrical conductivity enhancement, 0000 (1 November 1991); doi: 10.1117/12.47309
Ferroelectric and Dielectric Films
Proc. SPIE 1519, Properties and applications of ferroelectric and piezoelectric thin films, 0000 (1 November 1991); doi: 10.1117/12.47310
Proc. SPIE 1519, Diamond-like carbon thin films prepared by rf-plasma CVD, 0000 (1 November 1991); doi: 10.1117/12.47311
Films for Magnetic and Optical Recording
Proc. SPIE 1519, Magnetic steering of energy flow of linear and nonlinear magnetostatic waves in ferrimagnetic films, 0000 (1 November 1991); doi: 10.1117/12.47312
Semiconducting Films
Proc. SPIE 1519, Amorphous silicon thin film x-ray sensor, 0000 (1 November 1991); doi: 10.1117/12.47313
Optical Films
Proc. SPIE 1519, Study of C-H stretching vibration in hybrid Langmuir-Blodgett/alumina multilayers by infrared spectroscopy, 0000 (1 November 1991); doi: 10.1117/12.47314
Superlattice Films
Proc. SPIE 1519, Scaling properties of optical reflectance from quasiperiodic superlattices, 0000 (1 November 1991); doi: 10.1117/12.47315
Superconducting Films
Proc. SPIE 1519, Characterization and preparation of high-Tc YBa2Cu3O7-x thin films on Si with conducting indium oxide as a buffer layer, 0000 (1 November 1991); doi: 10.1117/12.47316
Ferroelectric and Dielectric Films
Proc. SPIE 1519, Formation of titanium nitride films by Xe+ ion-beam-enhanced deposition in a N2 gas environment, 0000 (1 November 1991); doi: 10.1117/12.47317
Infrared and Optoelectronic Films
Proc. SPIE 1519, Study of HgCdTe/CdTe interface structure grown by metal-organic chemical vapor deposition, 0000 (1 November 1991); doi: 10.1117/12.47318
Film Formation and Analysis
Proc. SPIE 1519, New deposition system for the preparation of doped a-Si:H, 0000 (1 November 1991); doi: 10.1117/12.47319
Semiconducting Films
Proc. SPIE 1519, New process for improving reverse characteristics of platinum silicide Schottky barrier power diodes, 0000 (1 November 1991); doi: 10.1117/12.47320
Organic and Polymer Films
Proc. SPIE 1519, Ionization potentials effects on CGL/CTL photoconductors, 0000 (1 November 1991); doi: 10.1117/12.47321
Infrared and Optoelectronic Films
Proc. SPIE 1519, Optical characterization of Hg1-xCdxTe/CdTe/GaAs multilayers grown by molecular beam epitaxy, 0000 (1 November 1991); doi: 10.1117/12.47322
Proc. SPIE 1519, Determination of thickness and refractal index of HgCdMnTe/CdMnTe VPE films by IR transmission spectrum, 0000 (1 November 1991); doi: 10.1117/12.47323
Film Formation and Analysis
Proc. SPIE 1519, Transition radiation in foil stack and x-ray laser, 0000 (1 November 1991); doi: 10.1117/12.47324
Ferroelectric and Dielectric Films
Proc. SPIE 1519, Preparation and magneto-optical properties of NdDyFeCoTi amorphous films, 0000 (1 November 1991); doi: 10.1117/12.47325
Films for Magnetic and Optical Recording
Proc. SPIE 1519, Multistable magnetostatic waves in thin film, 0000 (1 November 1991); doi: 10.1117/12.47326
Infrared and Optoelectronic Films
Proc. SPIE 1519, Incorporation of As into HgCdTe grown by MOCVD, 0000 (1 November 1991); doi: 10.1117/12.47327
Semiconducting Films
Proc. SPIE 1519, Thermal stabilities of a-Si:H films and its application to thyristor elements, 0000 (1 November 1991); doi: 10.1117/12.47328
Infrared and Optoelectronic Films
Proc. SPIE 1519, New appproach to colored thin film electroluminescence, 0000 (1 November 1991); doi: 10.1117/12.47329
Film Formation and Analysis
Proc. SPIE 1519, Growth of rf-sputtered selenium thin films, 0000 (1 November 1991); doi: 10.1117/12.47330
Films for Magnetic and Optical Recording
Proc. SPIE 1519, Dispersion of nonlinear magnetostatic surface waves on thin films, 0000 (1 November 1991); doi: 10.1117/12.47331
Proc. SPIE 1519, Organo-metallic thin film for erasable optical recording medium, 0000 (1 November 1991); doi: 10.1117/12.47332
Ferroelectric and Dielectric Films
Proc. SPIE 1519, Specific properties of ferroelectric thin films, 0000 (1 November 1991); doi: 10.1117/12.47333
Surface and Interface
Proc. SPIE 1519, Research on the temperature of thin film under ion beam bombarding, 0000 (1 November 1991); doi: 10.1117/12.47334
Infrared and Optoelectronic Films
Proc. SPIE 1519, Study of p-ZnTe/n-CdTe thin film heterojunction, 0000 (1 November 1991); doi: 10.1117/12.47335
Organic and Polymer Films
Proc. SPIE 1519, Defects in SIPOS film studied by ESR, 0000 (1 November 1991); doi: 10.1117/12.47336
Proc. SPIE 1519, New results on proton nuclear magnetic resonance of a-SiN:H films, 0000 (1 November 1991); doi: 10.1117/12.47337
Superlattice Films
Proc. SPIE 1519, Single crystallinity and oxygen diffusion in high-quality YBa2Cu3O7-delta films, 0000 (1 November 1991); doi: 10.1117/12.47338