PROCEEDINGS VOLUME 1604
11TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY | 25-27 SEPTEMBER 1991
11th Annual BACUS Symposium on Photomask Technology
IN THIS VOLUME

0 Sessions, 26 Papers, 0 Presentations
Lithography  (6)
Metrology  (1)
11TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY
25-27 September 1991
Sunnyvale, CA, United States
Data Management
Proc. SPIE 1604, Automated critical dimension and registration communication, 0000 (1 January 1992); doi: 10.1117/12.56932
Lithography
Proc. SPIE 1604, Positional errors due to substrate charging in e-beam lithography tools, 0000 (1 January 1992); doi: 10.1117/12.56933
Proc. SPIE 1604, Pattern generator specification for phase-shift 5X reticles, 0000 (1 January 1992); doi: 10.1117/12.56934
Proc. SPIE 1604, Improved performance of a CORE-2100 through a joint development program, 0000 (1 January 1992); doi: 10.1117/12.56935
Proc. SPIE 1604, Reflective masks for 1X deep ultraviolet lithography, 0000 (1 January 1992); doi: 10.1117/12.56936
Proc. SPIE 1604, Advanced e-beam lithography system in producing high-quality reticle for 64M-DRAM, 0000 (1 January 1992); doi: 10.1117/12.56937
Proc. SPIE 1604, Comparison of reflective mask technologies for soft x-ray projection lithography, 0000 (1 January 1992); doi: 10.1117/12.56938
Cleaning and Pelliclization
Proc. SPIE 1604, Printability of pellicle defects in DUV 0.5-um lithography, 0000 (1 January 1992); doi: 10.1117/12.56939
Proc. SPIE 1604, New look at incoming pellicle inspection, 0000 (1 January 1992); doi: 10.1117/12.56940
Inspection and Repair
Proc. SPIE 1604, Alternative to die-to-database mask inspection, 0000 (1 January 1992); doi: 10.1117/12.56941
Proc. SPIE 1604, Next generation laser-based mask repair tool, 0000 (1 January 1992); doi: 10.1117/12.56942
Proc. SPIE 1604, Reticle defect sizing and printability, 0000 (1 January 1992); doi: 10.1117/12.56943
Proc. SPIE 1604, Zero-bias PBS process for 5X reticles, 0000 (1 January 1992); doi: 10.1117/12.56944
Metrology
Proc. SPIE 1604, Two-dimensional photomask standards calibration, 0000 (1 January 1992); doi: 10.1117/12.56945
Phase-Shift Masks
Proc. SPIE 1604, Phase-shifting mask design tool, 0000 (1 January 1992); doi: 10.1117/12.56946
Proc. SPIE 1604, Issues associated with the commercialization of phase-shift masks, 0000 (1 January 1992); doi: 10.1117/12.56947
Proc. SPIE 1604, Optimization of real phase-mask performance, 0000 (1 January 1992); doi: 10.1117/12.56948
Proc. SPIE 1604, Evaluation of practical properties of a spin-on-glass for a shifter of phase-shift masks, 0000 (1 January 1992); doi: 10.1117/12.56949
Quality Management
Proc. SPIE 1604, Focusing on continuous improvement, 0000 (1 January 1992); doi: 10.1117/12.56950
Proc. SPIE 1604, Organizational dynamics and the pursuit of total quality, 0000 (1 January 1992); doi: 10.1117/12.56951
Proc. SPIE 1604, Economic survival in the '90s, 0000 (1 January 1992); doi: 10.1117/12.56952
Phase-Shift Masks
Proc. SPIE 1604, Continuous-slope phase-shift transition, 0000 (1 January 1992); doi: 10.1117/12.56953
Proc. SPIE 1604, Specifying phase-shift mask image quality parameters, 0000 (1 January 1992); doi: 10.1117/12.56954
Cleaning and Pelliclization
Proc. SPIE 1604, Lithography process improvements using "bag-in-a-bottle" chemical packaging and delivery system, 0000 (1 January 1992); doi: 10.1117/12.56955
Proc. SPIE 1604, Discriminating submicron lithography process variations with a white light confocal scanning optical microscope, 0000 (1 January 1992); doi: 10.1117/12.56956
Keynote Address
Proc. SPIE 1604, Evolution of the photomask industry, 0000 (1 January 1992); doi: 10.1117/12.56957
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